Chophimba cha vacuum chimaphatikizapo makamaka kuyika kwa nthunzi ya vacuum, chophimba chothira madzi ndi chophimba cha ayoni, zonse zomwe zimagwiritsidwa ntchito kuyika mafilimu osiyanasiyana achitsulo ndi osakhala achitsulo pamwamba pa zigawo za pulasitiki mwa kusungunula kapena kutsanulira madzi pansi pa mikhalidwe ya vacuum, zomwe zingapangitse chophimba choonda kwambiri pamwamba kukhala cholimba kwambiri, koma mtengo wake ndi wokwera, ndipo mitundu ya zitsulo zomwe zingagwiritsidwe ntchito ndi yocheperako, ndipo nthawi zambiri zimagwiritsidwa ntchito pophimba zinthu zapamwamba kwambiri.
Kuyika nthunzi ya vacuum ndi njira yotenthetsera chitsulocho pansi pa vacuum yambiri, zomwe zimapangitsa kuti chisungunuke, chisanduke nthunzi, ndikupanga filimu yopyapyala yachitsulo pamwamba pa chitsanzocho chitatha kuzizira, ndi makulidwe a 0.8-1.2 um. Imadzaza zigawo zazing'ono zopingasa ndi zozungulira pamwamba pa chinthu chopangidwa kuti chipeze malo ofanana ndi galasi. Pamene kuyika nthunzi ya vacuum kumachitika kuti mupeze mphamvu yowunikira galasi kapena kuti kuyika nthunzi ya chitsulo ndi utsi pang'ono, pansi pake payenera kuphimbidwa.
Kutulutsa mpweya nthawi zambiri kumatanthauza kutulutsa mpweya kwa magnetron, komwe ndi njira yotulutsira mpweya wochepa kutentha kwambiri. Njirayi imafuna vacuum ya pafupifupi 1 × 10-3Torr, yomwe ndi 1.3 × 10-3Pa vacuum state yodzazidwa ndi mpweya wopanda mphamvu argon (Ar), ndipo pakati pa pulasitiki substrate (anode) ndi chitsulo chachitsulo (cathode) kuphatikiza mphamvu yamagetsi yamphamvu, chifukwa cha kusonkhezera kwa electron kwa mpweya wopanda mphamvu wopangidwa ndi kutulutsa kuwala, zomwe zimapangitsa plasma, plasma idzaphulitsa maatomu a chitsulo chachitsulo ndikuyika pa pulasitiki substrate. Zophimba zambiri zachitsulo zimagwiritsa ntchito kutulutsa mpweya kwa DC, pomwe zinthu zadothi zosagwiritsa ntchito mpweya zimagwiritsa ntchito kutulutsa mpweya kwa RF AC.
Kuphimba ma ion ndi njira yomwe kutulutsa mpweya kumagwiritsidwa ntchito kupangira pang'ono mpweya kapena chinthu chosungunuka m'malo otayira mpweya, ndipo chinthu chosungunuka kapena zinthu zake zimayikidwa pa substrate mwa kuphulitsa ma ion a gasi kapena ma ion a chinthu chosungunuka. Izi zikuphatikizapo magnetron sputtering ion coating, reactive ion coating, hollow cathode discharge ion coating (hollow cathode vapor deposition method), ndi multi-arc ion coating (cathode arc ion coating).
Ofukula awiri mbali magnetron sputtering mosalekeza ❖ kuyanika mu mzere
Kugwiritsa ntchito kwakukulu, kungagwiritsidwe ntchito pazinthu zamagetsi monga layer ya EMI yotchingira la notebook shell, zinthu zathyathyathya, komanso zinthu zonse za kapu ya nyali mkati mwa kutalika kwina zitha kupangidwa. Kulemera kwakukulu konyamula katundu, kukanikiza pang'ono ndi kukanikiza kozungulira kwa makapu owala a conical kuti apange zokutira mbali ziwiri, zomwe zimatha kukhala ndi mphamvu yayikulu yonyamula katundu. Ubwino wokhazikika, kusinthasintha kwabwino kwa wosanjikiza wa filimu kuchokera ku gulu kupita ku gulu. Mlingo wapamwamba wa automation ndi mtengo wotsika wantchito.
– Nkhaniyi yatulutsidwa ndiwopanga makina ophikira vacuumGuangdong Zhenhua
Nthawi yotumizira: Januwale-23-2025
