Kuputira vacuum kunosanganisira kuisa vacuum vapor, sputtering coating uye ion coating, zvese izvi zvinoshandiswa kuisa mafirimu akasiyana-siyana esimbi neesiri esimbi pamusoro pezvikamu zvepurasitiki nekudiridza kana sputtering pasi pemamiriro evacuum, izvo zvinogona kuwana spure coating yakatetepa ine mukana wakanaka wekunamatira nekukurumidza, asi mutengo wacho wakakwirawo, uye mhando dzesimbi dzinogona kushandiswa dzakaderera, uye dzinowanzo shandiswa pakuputira zvinhu zvepamusoro-soro.
Kuisa simbi mumhepo inotonhorera (vacuum vapor deposition) inzira yekupisa simbi pasi pemvura inotonhorera, zvichiita kuti inyungudike, iite mhepo inoputika, uye iite firimu resimbi rakatetepa pamusoro pemuenzaniso mushure mekutonhora, ine ukobvu hwe 0.8-1.2 um. Inozadza zvikamu zvidiki zvakakombama uye zvakapinza pamusoro pechinhu chakagadzirwa kuti chiite segirazi. Kana simbi inotonhorera (vacuum vapor deposition) ikaitwa kuti iwane girazi rinopenya kana kuti iite simbi ine simbi isina kunamira zvakanyanya, pasi payo panofanira kunge pakaputirwa.
Kusputtering kunowanzoreva magnetron sputtering, inova nzira yekusputtering ine temperature yakaderera nekukurumidza. Maitiro aya anoda vacuum ye1×10-3Torr, kureva 1.3×10-3Pa vacuum state yakazadzwa ne inert gas argon (Ar), uye pakati pepurasitiki substrate (anode) nesimbi target (cathode) pamwe ne high-voltage direct current, nekuda kwekuwedzeredzwa kweelectron kwegasi risina kujeka rinogadzirwa nekubuda kwechiedza, zvichigadzira plasma, plasma inoburitsa maatomu esimbi target yoaisa papurasitiki substrate. Mazhinji esimbi coating anoshandisa DC sputtering, nepo zvinhu zveceramic zvisina conductive zvinoshandisa RF AC sputtering.
Kuvhara maion inzira inoshandiswa kuburitsa gasi kuti ionise gasi kana chinhu chakabviswa mvura pasi pemamiriro evacuum, uye chinhu chakabviswa mvura kana ma reactants acho anoiswa pa substrate nekuputira maion egasi kana maion echinhu chakabviswa mvura. Izvi zvinosanganisira magnetron sputtering ion coating, reactive ion coating, hollow cathode discharge ion coating (hollow cathode vapor deposition method), uye multi-arc ion coating (cathode arc ion coating).
Vertical mativi maviri magnetron sputtering kuramba unhani mumutsara
Kushanda kwakafara, kunogona kushandiswa kune zvigadzirwa zvemagetsi zvakaita seEMI shielding layer yenotebook shell, zvigadzirwa zvakati sandara, uye kunyange zvigadzirwa zvese zvemakapu emwenje mukati mehurefu hwakati zvinogona kugadzirwa. Kukwanisa kukuru kwekutakura, kubatanidza kwakabatana uye kubatanidza kwakagadzika kwemakapu emwenje econical ekubatanidza mativi maviri, ayo anogona kuva nekukwanisa kukuru kwekutakura. Hunhu hwakagadzikana, kuenderana kwakanaka kwechikamu chefirimu kubva kune chimwe kuenda kune chimwe. Dhigirii repamusoro rekushandisa otomatiki uye mutengo wakaderera wekushanda.
–Chinyorwa ichi chakaburitswa namugadziri wemuchina wevacuum coatingGuangdong Zhenhua
Nguva yekutumira: Ndira-23-2025