Ukufakwa kwe-vacuum kubandakanya ikakhulu ukufakwa komphunga we-vacuum, ukufakelwa kwe-sputtering kunye nokufakelwa kwe-ion, zonke ezisetyenziselwa ukufaka iifilimu ezahlukeneyo zesinyithi kunye nezingezizo zesinyithi kumphezulu weendawo zeplastiki ngokuhluza okanye ukutshiza phantsi kweemeko ze-vacuum, ezinokufumana ukufakelwa komphezulu okuncinci kakhulu kunye nenzuzo ebalaseleyo yokunamathela ngokukhawuleza, kodwa ixabiso liphezulu, kwaye iintlobo zesinyithi ezinokusetyenziswa zincinci, kwaye zihlala zisetyenziselwa ukufakelwa kwemveliso yodidi oluphezulu.
Ukufakwa komphunga wevacuum yindlela yokufudumeza isinyithi phantsi kwevacuum ephezulu, okwenza ukuba inyibilike, iphele, kwaye yenze ifilimu yesinyithi ebhityileyo kumphezulu wesampuli emva kokuba ipholile, enobukhulu obuyi-0.8-1.2 um. Izalisa iindawo ezincinci ezigobileyo nezingqukuva kumphezulu wemveliso eyenziweyo ukuze ifumane umphezulu ofana nesipili. Xa ukufakwa komphunga wevacuum kwenziwa nokuba kukufumana isiphumo sesipili esibonakalayo okanye ukufutha intsimbi nge-vacuum ngokunamathela okuphantsi, umphezulu ongezantsi kufuneka ugqunywe.
Ukutshiza kudla ngokubhekisa kwi-magnetron sputtering, indlela yokutshiza ekhawulezayo enobushushu obuphantsi. Le nkqubo ifuna i-vacuum emalunga ne-1 × 10-3Torr, oko kukuthi i-1.3 × 10-3Pa vacuum state egcwele i-inert gas argon (Ar), kwaye phakathi kwe-substrate yeplastiki (anode) kunye ne-metal target (cathode) kunye ne-high-voltage direct current, ngenxa yokukhupha i-electron ye-inert gas eveliswa kukukhupha ukukhanya, okuvelisa i-plasma, i-plasma iya kudubula ii-athomu ze-metal target ize izibeke kwi-substrate yeplastiki. Uninzi lwe-metal coatings eziqhelekileyo zisebenzisa i-DC sputtering, ngelixa izinto ze-ceramic ezingezizo eziqhubayo zisebenzisa i-RF AC sputtering.
I-ion coating yindlela apho kusetyenziswa i-gas discharge ukuze i-gas okanye into ephumayo i-ion ingabi yi-ion phantsi kweemeko ze-vacuum, kwaye i-evaporated substance okanye ii-reactants zayo zifakwa kwi-substrate ngokubhomba ii-gas ions okanye ii-ion ze-evaporated substance. Ezi ziquka i-magnetron sputtering ion coating, i-reactive ion coating, i-hollow cathode discharge ion coating (indlela yokufaka umphunga we-cathode engenanto), kunye ne-multi-arc ion coating (i-cathode arc ion coating).
I-magnetron sputtering ethe nkqo eneecala ezimbini ehambelanayo
Ukusetyenziswa ngokubanzi, kungasetyenziselwa iimveliso ze-elektroniki ezifana nomaleko wokukhusela we-notebook shell EMI, iimveliso ezithe tyaba, kwanazo zonke iimveliso zekomityi yezibane ezikwinqanaba elithile lokuphakama zinokwenziwa. Umthamo omkhulu wokulayisha, ukubotshwa okuncinci kunye nokubotshwa okudibeneyo kweekomityi zokukhanya ezijijekileyo zokugquma amacala amabini, ezinokuba nomthamo omkhulu wokulayisha. Umgangatho ozinzileyo, ukuhambelana okuhle komaleko wefilimu ukusuka kwibhetshi ukuya kwibhetshi. Inqanaba eliphezulu lokuzenzekelayo kunye neendleko eziphantsi zokusebenza.
–Eli nqaku likhutshwe nguumenzi womatshini wokugquma nge-vacuumGuangdong Zhenhua
Ixesha leposi: Jan-23-2025