Ịgbasa magnetron na-emeghachi omume pụtara na a na-enye gas na-emeghachi omume iji meghachi omume na ụmụ irighiri ihe na-agbapụta n'usoro ịgbasa iji mepụta ihe nkiri ngwakọta. Ọ nwere ike na-enye gas reactive iji meghachi omume na sputtering compound lekwasịrị n'otu oge, na nwekwara ike inye reactive gas meghachi omume na sputtering metal ma ọ bụ alloy lekwasịrị n'otu oge iji kwadebe a compound film na a nyere chemical ratio.The àgwà nke reactive magnetron sputtering iji kwadebe ihe nkiri ihe bụ:
(1) Ihe ndị e lekwasịrị anya na-eji reactive magnetron sputtering (otu ihe mgbaru ọsọ ma ọ bụ multi-element target) na mmeghachi omume gas dị mfe iji nweta ịdị ọcha dị elu, nke na-enyere aka ịkwadebe ihe nkiri ihe nkiri dị elu.
(2) Na reactive magnetron sputtering, site ukpụhọde deposition usoro parameters, chemical ratio ma ọ bụ na-abụghị kemịkalụ ruru nke compound film nwere ike kwadebere, nke mere iji nweta nzube nke na-achịkwa ihe nkiri e ji mara site n'igbanwe mejupụtara nke film.
(3) Okpomọkụ nke mkpụrụ anaghị adị oke elu n'oge usoro ntinye ndọta magnetron na-arụ ọrụ, na usoro imepụta fim anaghị achọ ka ekpo ọkụ na oke okpomọkụ, yabụ enwere mgbochi ole na ole na ihe mkpụrụ.
(4) Reactive magnetron sputtering dabara adaba maka nkwadebe nke nnukwu ihe nkiri dị n'otu akụkụ, ma nwee ike nweta mmepụta mmepụta ihe na mmepụta kwa afọ nke otu nde square mita nke mkpuchi site na otu igwe. N'ọtụtụ ọnọdụ, enwere ike ịgbanwe ọdịdị nke ihe nkiri ahụ site n'ịgbanwe oke gas na-emeghachi omume na gas inert n'oge sputtering. Dịka ọmụmaatụ, enwere ike ịgbanwe ihe nkiri ahụ site na ígwè gaa na semiconductor ma ọ bụ na-abụghị ígwè.
——Akụkọ a nwereonye na-emepụta igwe mkpuchi ikukuGuangdong Zhenhua wepụtara
Oge nzipu: Ọgọst-31-2023