Ion beam i kokuaia deposition a me ka ikehu haahaa kumu ion

1. Ion kukuna kokua deposition nui hoʻohana haʻahaʻa ikehu ion kukuna e kokua i ka ili hoololi o na mea.

(1) Nā hiʻohiʻona o ka waiho ʻana i ka ion assisted

I ka wā o ke kaʻina hana uhi, hoʻomau mau ʻia nā ʻāpana kiʻiʻoniʻoni i hoʻopaʻa ʻia e nā ion i hoʻopiʻi ʻia mai ke kumu ion ma ka ʻili o ka substrate i ka wā e uhi ʻia ana me nā kaola ion i hoʻopaʻa ʻia.

(2) Ke kuleana o ka waiho ʻana i kōkua ʻia i ka ion

Pahū nā ion ikehu kiʻekiʻe i nā ʻāpana kiʻiʻoniʻoni i hoʻopaʻa ʻia i kēlā me kēia manawa; Ma ka hoʻoili ʻana i ka ikehu, loaʻa i nā ʻāpana i waiho ʻia ka ikehu kinetic ʻoi aku ka nui, ma laila e hoʻomaikaʻi ai i ke kānāwai o ka nucleation a me ka ulu; E hana i ka hopena compaction ma ka ʻiʻo membrane i kēlā me kēia manawa, e ulu nui ana ka kiʻiʻoniʻoni; Inā hoʻokomo ʻia nā ion kinoea reactive, hiki ke hoʻokumu ʻia kahi papa hui stoichiometric ma luna o ka ʻili o ka mea, a ʻaʻohe pilina ma waena o ka papa hui a me ka substrate.

2. Kumu Ion no ka waiho ʻana i ke kukui ion

ʻO ka hiʻohiʻona o ka ion beam assisted deposition, ʻo ia ka hoʻomau ʻia ʻana o nā ʻātoma papa kiʻiʻoniʻoni (deposition particles) e nā ion ikehu haʻahaʻa mai ke kumu ion ma ka ʻili o ka substrate, e hoʻopololei loa i ke ʻano kiʻiʻoniʻoni a hoʻomaikaʻi i ka hana o ka papa kiʻiʻoniʻoni. He ≤ 500eV ka ikehu E o ka kukuna ion. Hoʻohana maʻamau ʻia nā kumu ion: Kauffman ion source, Hall ion source, anode layer ion source, hollow cathode Hall ion source, radio frequency ion source, etc.