Reactive magnetron sputtering yana nufin cewa ana ba da iskar gas mai amsawa don amsawa tare da barbashi da aka watsa a cikin aiwatar da sputtering don samar da fim ɗin fili. Yana iya samar da iskar gas mai amsawa don amsawa tare da maƙasudin fili a lokaci guda, kuma yana iya samar da iskar gas don amsawa tare da maƙalar sputtering karfe ko gami da manufa a lokaci guda don shirya fim ɗin fili tare da ƙimar sinadarai da aka ba da.
(1) Abubuwan da aka yi niyya da aka yi amfani da su don faɗakarwa magnetron mai amsawa (manufa guda ɗaya ko manufa iri-iri) da iskar gas suna da sauƙi don samun babban tsarki, wanda ke dacewa da shirye-shiryen fina-finai masu tsafta.
(2) A reactive magnetron sputtering, ta daidaitawa da deposition sigogi sigogi, sinadaran rabo ko wadanda ba sinadaran rabo na fili fina-finai za a iya shirya, don cimma manufar tsara da fim halaye ta daidaitawa da abun da ke ciki na fim.
(3) The zafin jiki na substrate ne gaba ɗaya ba ma high a lokacin reactive magnetron sputtering ajiya tsari, da kuma film kafa tsari yawanci ba ya bukatar da substrate da za a mai tsanani zuwa sosai high yanayin zafi, don haka akwai m hani a kan substrate abu.
(4) Reactive magnetron sputtering ya dace da shirye-shiryen manyan fina-finai masu kama da juna na bakin ciki, kuma yana iya samun masana'antu na masana'antu tare da fitarwa na shekara-shekara na murabba'in murabba'in miliyan ɗaya daga injin guda ɗaya. A lokuta da yawa, ana iya canza yanayin fim ɗin ta hanyar canza rabon iskar gas ɗin da ba ta dace ba lokacin sputtering. Misali, ana iya canza fim ɗin daga karfe zuwa semiconductor ko mara ƙarfe.
——Wannan labarin yana dainjin shafa injin injinAn saki Guangdong Zhenhua
Lokacin aikawa: Agusta-31-2023