Ngokubanzi, i-CVD ingahlukaniswa cishe ibe izinhlobo ezimbili: eyodwa isemzimbeni owodwa ekufakweni komphunga we-substrate wengqimba ye-epitaxial ye-single-crystal, okuyi-CVD encane; enye ukufakwa kwamafilimu amancane ku-substrate, kufaka phakathi amafilimu emikhiqizo eminingi kanye nama-amorphous. Ngokwezinhlobo ezahlukene zamagesi omthombo asetshenziswayo, i-CVD ingahlukaniswa ibe yindlela yokuthutha i-halogen kanye ne-metal-organic chemical vapor deposition (MOCVD), eyakuqala ibe yi-halide njengomthombo wegesi, eyakamuva ibe yi-metal-organic compounds njengomthombo wegesi. Ngokwengcindezi ekamelweni lokusabela, ingahlukaniswa ibe izinhlobo ezintathu eziyinhloko: i-atmospheric pressure CVD (APCVD), i-low pressure CVD (LPCVD) kanye ne-ultra-high vacuum CVD (UHV/CVD). I-CVD ingasetshenziswa futhi njengendlela yokusiza ethuthukisa amandla, futhi kulezi zinsuku ezivamile zifaka phakathi i-plasma-enhanced CVD (PECVD) kanye ne-light-enhanced CVD (PCVD), njll. I-CVD empeleni iyindlela yokufaka igesi ngesigaba segesi.
I-CVD empeleni iyindlela yokwenza ifilimu lapho into yesigaba segesi isabela khona ngamakhemikhali ekushiseni okuphezulu ukuze ikhiqize into eqinile ebekwa ku-substrate. Ngokukhethekile, ama-halide ensimbi aguquguqukayo noma ama-organic compounds ensimbi axutshwa negesi ethwala njenge-H, Ar, noma i-N, bese ithuthwa ngokulinganayo iye ku-substrate yokushisa okuphezulu ekamelweni lokusabela ukuze kwakhiwe ifilimu encane ku-substrate ngokusebenzisa ukusabela kwamakhemikhali. Kungakhathaliseki ukuthi yiluphi uhlobo lwe-CVD, ukufakwa kungenziwa ngempumelelo kumele kuhlangabezane nezimo ezilandelayo eziyisisekelo: Okokuqala, ekushiseni kokufakwa, ama-reactants kumele abe nomfutho ophezulu womusi; Okwesibili, umkhiqizo wokusabela, ngaphezu kwediphozithi oyifunayo yesimo esiqinile, lonke isimo segesi; Okwesithathu, idiphozithi ngokwayo kufanele ibe nomfutho ophansi womusi ukuqinisekisa ukuthi inqubo yokusabela kokufakwa ingagcinwa kuyo yonke inqubo ye-substrate eshisayo; Okwesine, izinto ze-substrate zithuthwa ngokufanayo ziye ekamelweni lokusabela ku-substrate, ngokusebenzisa ukusabela kwamakhemikhali ukuze kwakhiwe ifilimu encane. Okwesine, umfutho womusi wezinto ze-substrate uqobo kufanele futhi ube phansi ngokwanele ekushiseni kokufakwa.
–Lesi sihloko sikhishwe byumenzi womshini wokumboza nge-vacuumI-Guangdong Zhenhua
Isikhathi sokuthunyelwe: Meyi-04-2024