Mukutaura kwakadzama, CVD inogona kukamurwa kuita mhando mbiri: imwe iri muchigadzirwa chimwe chete chiri pamusoro pe substrate vapor deposition ye single-crystal epitaxial layer, iyo iri CVD yakamanikana; imwe ndeye kuiswa kwemafirimu matete pa substrate, kusanganisira mafirimu akawanda uye amorphous. Zvichienderana nemhando dzakasiyana dzemagasi anoshandiswa, CVD inogona kukamurwa kuita halogen transport method uye metal-organic chemical vapor deposition (MOCVD), yekutanga to halide segasi, yekupedzisira kune metal-organic compounds segasi. Zvichienderana nekumanikidzwa kuri mu reaction chamber, inogona kukamurwa kuita mhando nhatu huru: atmospheric pressure CVD (APCVD), low pressure CVD (LPCVD) uye ultra-high vacuum CVD (UHV/CVD). CVD inogonawo kushandiswa senzira yekuwedzera simba, uye mazuva ano yakajairika inosanganisira plasma-enhanced CVD (PECVD) uye light-enhanced CVD (PCVD), nezvimwewo. CVD inzira yekuisa gas-phase.
CVD inzira yekugadzira firimu umo chinhu chegasi-phase chinogadziriswa nemakemikari pakupisa kwakanyanya kuti chigadzire chinhu chakasimba chinoiswa pasubstrate. Kunyanya, volatile metal halides kana metal organic compounds zvinosanganiswa negasi rinotakura senge H, Ar, kana N, uye zvozoendeswa zvakaenzana kune substrate ine kupisa kwakanyanya mukamuri rekuita kuti zvigadzire firimu rakatetepa pasubstrate kuburikidza nekuita kwemakemikari. Hazvina mhosva kuti nderupi rudzi rweCVD, kuiswa kunogona kuitwa zvinobudirira kunofanirwa kusangana nemamiriro anotevera ekutanga: Chekutanga, pakupisa kwekuisa, reactants inofanira kunge iine vapor pressure yakakwira zvakakwana; Chechipiri, reaction product, pamusoro pedeposit inodiwa yesolid state, mamwe mamiriro egasi; Chechitatu, kuiswa pachako kunofanirwa kunge kwakaderera zvakakwana vapor pressure kuti ive nechokwadi chekuti deposition reaction process inogona kuchengetwa mukuita kwese kwesubstrate inopisa; Chechina, substrate material inotakurwa zvakaenzana kuenda kureaction chamber iri pasubstrate, kuburikidza nereaction yemakemikari kuti igadzire firimu rakatetepa. Chechina, vapor pressure yesubstrate material pachayo inofanirawo kunge yakaderera zvakakwana pakupisa kwekuisa.
-Chinyorwa ichi chaburitswa bymugadziri wemuchina wevacuum coatingGuangdong Zhenhua
Nguva yekutumira: Chivabvu-04-2024