Ngokubanzi, i-CVD ingahlulwahlulwa ibe ziintlobo ezimbini: enye ikwimveliso enye kwi-substrate vapor deposition ye-single-crystal epitaxial layer, eyi-CVD encinci; enye kukubekwa kweefilimu ezincinci kwi-substrate, kubandakanya iifilimu ezininzi kunye neefilimu ezi-amorphous. Ngokweentlobo ezahlukeneyo zeegesi zemvelaphi ezisetyenzisiweyo, i-CVD ingahlulwahlulwa ibe yindlela yokuthutha i-halogen kunye ne-metal-organic chemical vapor deposition (MOCVD), eyangaphambili i-to halide njengomthombo wegesi, eyakugqibela ibe yi-metal-organic compounds njengomthombo wegesi. Ngokwengcinezelo kwigumbi lokusabela, ingahlulwa ibe ziintlobo ezintathu eziphambili: uxinzelelo lomoya i-CVD (APCVD), uxinzelelo oluphantsi lwe-CVD (LPCVD) kunye ne-ultra-high vacuum CVD (UHV/CVD). I-CVD ingasetyenziswa njengendlela yokuncedisa eyongeziweyo yamandla, kwaye kule mihla eziqhelekileyo ziquka i-plasma-enhanced CVD (PECVD) kunye ne-light-enhanced CVD (PCVD), njl. I-CVD ngokuyintloko yindlela yokubeka igesi.
I-CVD ngokuyintloko yindlela yokwenza ifilimu apho into yesigaba segesi isabela ngokwekhemikhali kubushushu obuphezulu ukuvelisa into eqinileyo ebekwe kwi-substrate. Ngokukodwa, ii-halides zesinyithi eziguquguqukayo okanye iikhompawundi zesinyithi eziphilayo zixutywa negesi ethwala njenge-H, Ar, okanye i-N, ize ithuthwe ngokulinganayo kwi-substrate yobushushu obuphezulu kwigumbi lokusabela ukuze kwenziwe ifilimu encinci kwi-substrate ngokusebenzisa i-chemical reaction. Nokuba loluphi uhlobo lwe-CVD, i-deposition inokwenziwa ngempumelelo kufuneka ihlangabezane nale miqathango ilandelayo: Okokuqala, kubushushu bokubeka, ii-reactants kufuneka zibe noxinzelelo lomphunga oluphezulu ngokwaneleyo; Okwesibini, imveliso ye-reaction, ukongeza kwidiphozithi efunekayo yesimo esiqinileyo, lonke ilizwe le-gaseous; Okwesithathu, idiphozithi ngokwayo kufuneka ibe noxinzelelo lomphunga oluphantsi ngokwaneleyo ukuqinisekisa ukuba inkqubo ye-deposition reaction inokugcinwa kuyo yonke inkqubo ye-substrate eshushu; Okwesine, izinto ze-substrate zithuthwa ngokufanayo kwigumbi le-reaction kwi-substrate, ngokusebenzisa i-chemical reaction ukuze zenze ifilimu encinci. Okwesine, uxinzelelo lomphunga wezinto ze-substrate ngokwayo kufuneka lube phantsi ngokwaneleyo kubushushu bokubeka.
–Eli nqaku likhutshiwe byumenzi womatshini wokugquma nge-vacuumGuangdong Zhenhua
Ixesha leposi: Meyi-04-2024