Izinhlobo ze-CVD Technology

Uma sikhuluma kabanzi, i-CVD ingahlukaniswa ibe izinhlobo ezimbili: eyodwa isemkhiqizo owodwa ku-substrate vapor deposition ye-single-crystal epitaxial layer, eyi-CVD encane; okunye ukufakwa kwamafilimu amancanyana ku-substrate, okuhlanganisa amafilimu anemikhiqizo eminingi kanye ne-amorphous. Ngokwezinhlobo ezahlukene zamagesi omthombo asetshenziswayo, i-CVD ingahlukaniswa ngendlela yokuthutha i-halogen kanye ne-metal-organic chemical vapor deposition (MOCVD), eyokuqala ibe yi-halide njengomthombo wegesi, eyesibili ibe yizinhlanganisela zensimbi-organic njengomthombo wegesi. Ngokwengcindezi egunjini lokusabela, ingahlukaniswa ngezinhlobo ezintathu eziyinhloko: ingcindezi yomoya CVD (APCVD), low pressure CVD (LPCVD) kanye ultra-high vacuum CVD (UHV/CVD).CVD ingasetshenziswa njengendlela asizayo ethuthukisiwe amandla, futhi kulezi zinsuku ezivamile zihlanganisa plasma-CVDCVDhanced plasma kanye ne-CVDCVDhanced (PCVD), njll. I-CVD iyindlela yokubeka isigaba segesi.

I-CVD empeleni iyindlela yokwenza ifilimu lapho into yesigaba segesi isabela ngamakhemikhali ekushiseni okuphezulu ukuze kukhiqizwe into eqinile efakwa ku-substrate. Ngokukhethekile, i-halide yensimbi eguquguqukayo noma izakhi ze-organic zensimbi zixubene negesi elithwala njenge-H, Ar, noma i-N, bese lithuthwa ngokufanayo liyiswe endaweni engaphansi enezinga eliphezulu lokushisa ekamelweni lokusabela ukuze kwenziwe ifilimu elincanyana ku-substrate ngokusabela kwamakhemikhali. Kungakhathaliseki ukuthi yiluphi uhlobo lwe-CVD, ukufakwa kungenziwa ngempumelelo kufanele kuhlangabezane nezimo ezilandelayo eziyisisekelo: Okokuqala, ekushiseni kwe-deposition, ama-reactants kufanele abe nomfutho we-vapor ophakeme ngokwanele; Okwesibili, umkhiqizo wokusabela, ngaphezu kwediphozi oyifunayo yesimo esiqinile, yonke indawo yegesi; Okwesithathu, idiphozi ngokwayo kufanele ibe nomfutho womoya ophansi ngokwanele ukuze kuqinisekiswe ukuthi inqubo yokusabela kwe-deposition ingagcinwa kuyo yonke inqubo ye-substrate eshisayo; Okwesine, i-substrate material ihanjiswa ngendlela efanayo ekamelweni lokusabela ku-substrate, ngokusebenzisa ukusabela kwamakhemikhali ukwenza ifilimu elincanyana. Okwesine, umfutho we-vapor we-substrate material ngokwawo kufanele ube phansi ngokwanele ezingeni lokushisa lokubeka.

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