I-filament ye-tungsten ifudunyezwa ukuya kubushushu obuphezulu obukhupha ii-electron ezishushu ukuze zikhuphe umsinga we-electron oxineneyo, kwaye kwangaxeshanye i-electrode ekhawulezayo isetiwe ukukhawulezisa ii-electron ezishushu zibe ngumsinga we-electron onamandla aphezulu. Ukuhamba kwe-electron okuxineneyo, okunamandla aphezulu kunokuba yi-ionization ye-chlorine engaphezulu, ii-atom zefilimu yesinyithi ezingaphezulu zibe yi-ionized ukuze kufumaneke ii-ion ze-chloride ezingaphezulu ukuphucula izinga lokutshiza, ngaloo ndlela kwandiswa izinga lokufumba: ingaba yi-ionization yesinyithi engaphezulu ukuphucula izinga lokufumba kwesinyithi, okuncedayo ekuphenduleni kokufumba kwefilimu edibeneyo; ii-ion zefilimu yesinyithi ukufikelela kwindawo yokusebenza ukuphucula uxinano lwangoku lwento yokusebenza, ngaloo ndlela kwandiswa izinga lokufumba.
Kwi-magnetron sputtering hard coating, Ukwanda koxinano lwangoku kunye nolungelelwaniso lwefilimu ye-workpiece ngaphambili nangasemva kwe-hot cathodizing. I-TiSiCN ngaphambi kokongeza i-hot cathode, uxinano lwangoku kwi-workpiece yi-0.2mA/mm kuphela, emva kokwanda kwe-hot cathode ukuya kwi-4.9mA/mm2, okulingana nokwanda kwamaxesha angama-24 okanye ngaphezulu, kwaye ulungelelwaniso lwefilimu luxinene ngakumbi. Kuyabonakala ukuba kwi-magnetron sputtering coating technology, ukongezwa kwe-hot cathode kusebenza kakhulu ekuphuculeni izinga lokufakwa kwe-magnetron sputtering kunye nomsebenzi wee-film particles. Le teknoloji inokuphucula kakhulu ubomi bee-turbine blades, ii-mud pump plungers, kunye nee-grinder parts.
–Eli nqaku likhutshwe nguumenzi womatshini wokugquma nge-vacuumGuangdong Zhenhua
Ixesha lokuthumela: Oktobha-11-2023