Lub tungsten filament raug cua sov rau qhov kub siab uas tso tawm cov electrons kub kom tso tawm cov electrons siab, thiab tib lub sijhawm ib qho electrode accelerating tau teeb tsa los ua kom cov electrons kub mus rau hauv cov electron stream siab. High-density, high-energy electron flow tuaj yeem ua rau chlorine ionization ntau dua, ntau cov hlau zaj duab xis txheej atoms ionized kom tau txais ntau cov chloride ions los txhim kho qhov sputtering rate, yog li ua rau kom cov deposition rate: tuaj yeem ua rau ntau cov hlau ionization los txhim kho cov hlau ionization rate, conducive rau cov tshuaj tiv thaiv ntawm cov compound zaj duab xis deposition; hlau zaj duab xis txheej ions kom ncav cuag cov workpiece los txhim kho qhov tam sim no ntawm cov workpiece, yog li ua rau kom cov deposition rate.
Hauv cov txheej txheem magnetron sputtering nyuaj, qhov ceev tam sim no thiab kev teeb tsa zaj duab xis ntawm cov khoom ua haujlwm pem hauv ntej thiab tom qab ntawm cov cathodizing kub. TiSiCN ua ntej ntxiv cov cathode kub, qhov ceev tam sim no ntawm cov khoom ua haujlwm tsuas yog 0.2mA / hli, tom qab nce hauv cathode kub mus rau 4.9mA / mm2, uas yog sib npaug rau kev nce ntawm 24 zaug lossis ntau dua, thiab cov txheej txheem zaj duab xis yog ntau dua. Nws tuaj yeem pom tias hauv cov txheej txheem magnetron sputtering txheej txheem, qhov ntxiv ntawm cov cathode kub yog qhov zoo heev hauv kev txhim kho tus nqi magnetron sputtering deposition thiab kev ua haujlwm ntawm cov khoom zaj duab xis. Cov thev naus laus zis no tuaj yeem txhim kho lub neej ntawm cov hniav turbine, cov twj tso kua mis av nkos, thiab cov khoom sib tsoo.
– Tsab xov xwm no yog tso tawm los ntawmlub tshuab nqus tsev txheej tshuab chaw tsim khoomGuangdong Zhenhua
Lub sijhawm tshaj tawm: Lub Kaum Hli-11-2023