I-tungsten filament ifudunyezwa kubushushu obuphezulu obukhupha ii-electron ezishushu ukuze zikhuphe umsinga we-electron woxinaniso oluphezulu, kwaye kwangaxeshanye i-electrode ekhawulezayo imiselwe ukukhawulezisa ii-electron ezishushu zibe ngumsinga we-electron onamandla. Ubuninzi obuphezulu, ukuhamba kwe-electron ephezulu kunokuba yi-chlorine ionization, i-athomu yefilimu yesinyithi engaphezulu ye-athomu ye-ionized ukuze ifumane i-ion ye-chloride ngakumbi ukuphucula izinga lokufafaza, ngaloo ndlela ikhulise izinga lokubeka: ingaba yi-ionization yesinyithi ngakumbi ukuphucula izinga le-ionization yesinyithi, ehambelana nokusabela kokubekwa kwefilimu edibeneyo; ifilimu umaleko ion ion ukufikelela workpiece ukuphucula ingxinano yangoku yesiqwenga umsebenzi, ngaloo ndlela ukwandisa izinga deposition.
Kwimagnetron egalela icoat eqinileyo, Ukonyuka koxinano lwangoku kunye nombutho wefilimu wesixhobo sokusebenza ngaphambili nangasemva kwecathodizing eshushu. I-TiSiCN ngaphambi kokongezwa kwe-cathode eshushu, ukuxinana kwangoku kwi-workpiece yi-0.2mA / mm kuphela, emva kokunyuka kwe-cathode eshushu ukuya kwi-4.9mA / mm2, elingana nokunyuka kwamaxesha angama-24 okanye kunjalo, kwaye umbutho wefilimu unzima kakhulu. Ingabonwa ukuba kwi-magnetron sputtering coating technology, ukongezwa kwe-cathode eshushu kuyasebenza kakhulu ekuphuculeni izinga lokubeka i-magnetron sputtering kunye nomsebenzi weengqungquthela zefilimu. Obu buchwephesha bunokuphucula ngokubonakalayo ubomi bamagqabi einjini yomoya, iimpompo zempompo zodaka, kunye neendawo zokusila.
–Eli nqaku likhutshwa nguumenzi womatshini wokugqumaGuangdong Zhenhua
Ixesha lokuposa: Oct-11-2023