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Noocyada Tignoolajiyada CVD

Isha maqaalka:Zhenhua vacuum
Akhri:10
La daabacay:24-05-04

Marka si ballaadhan loo hadlo, CVD waxa loo qaybin karaa qiyaas ahaan laba nooc: mid waxa uu ku jiraa sheyga keliya ee ku yaala kaydka uumiga substrate-ka ee lakabka epitaxial-ka-crystal, kaas oo cidhiidhi ah CVD; Midda kale waa ku dhejinta filimada khafiifka ah ee substrate-ka, oo ay ku jiraan filimo badan iyo amorphous. Marka loo eego noocyada kala duwan ee gaasaska isha ee la isticmaalo, CVD waxa loo qaybin karaa habka gaadiidka halogen iyo kaydka uumiga kiimikada birta-organic (MOCVD), kii hore ee halide sida il gaas, kan dambe ilaa xeryahooda birta-organic sida il gaas. Marka loo eego cadaadiska qolka falcelinta, waxaa loo qaybin karaa saddex nooc oo waaweyn: Cadaadiska atmospheric CVD (APCVD), CVD cadaadis hooseeya (LPCVD) iyo ultra-high vacuum CVD (UHV/CVD) . (PCVD), iwm. CVD asal ahaan waa habka dhigista wejiga gaaska.

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CVD asal ahaan waa habka filim samaynta kaas oo walax gaas-waji kiimiko ah looga falceliyo heerkulka sare si loo soo saaro walax adag oo lagu shubo substrate. Gaar ahaan, khaliifyada birta ah ee kacsan ama xeryahooda organic birta ah ayaa lagu qasaa gaaska qaade sida H, Ar, ama N, ka dibna si isku mid ah loogu raraa substrate heerkulkiisu sarreeyo oo ku yaal qolka falcelinta si loo sameeyo filim khafiif ah substrate-ka iyada oo loo marayo falcelin kiimikaad. Nooc kasta oo CVD ah, dhigista si guul leh ayaa loo fulin karaa waa inay buuxisaa shuruudaha aasaasiga ah ee soo socda: Marka hore, heerkulka meelaynta, fal-celinta waa inay lahaadaan cadaadis sare oo ku filan; Marka labaad, sheyga falcelinta, marka lagu daro deebaajiga la rabo ee gobolka adag, inta kale ee gaaska; Seddexaad, deebaajiga laftiisa waa inuu ahaadaa mid ku filan cadaadiska uumiga hooseeya si loo hubiyo in habka falcelinta dhigaalka lagu hayn karo dhammaan habka substrate-ka kulul; Afaraad, walxaha substrate-ka ayaa si isku mid ah loogu raray qolka falcelinta ee substrate-ka, iyada oo loo marayo falcelinta kiimikada si loo sameeyo filim khafiif ah. Marka afraad, cadaadiska uumiga ee walxaha substrate-ka laftiisa waa inuu ahaado mid hooseeya oo ku filan heerkulka kaydinta.

–Maqaalkan waa la sii daayay bysoo saaraha mashiinka daahan vacuumGuangdong Zhenhua


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