Mukutaura, CVD inogona kukamurwa kuita mhando mbiri: imwe iri muchigadzirwa chimwe chete pane substrate vapor deposition ye single-crystal epitaxial layer, iri nhete CVD; imwe yacho ndeyekuiswa kwemafirimu matete pane substrate, kusanganisira akawanda-chigadzirwa uye amorphous mafirimu. Zvinoenderana nemhando dzakasiyana dzemagasi anoshandiswa, CVD inogona kukamurwa kuita halogen nzira yekufambisa uye simbi-organic kemikari vapor deposition (MOCVD), iyo yaimbove halide seyakagashira sosi, iyo yekupedzisira kune simbi-organic makomisheni seyakagadzika sosi. Zvinoenderana nekumanikidza kuri mukamuri rekuita, inogona kukamurwa kuita mhando nhatu huru: atmospheric pressure CVD (APCVD), low pressure CVD (LPCVD) uye Ultra-high vacuum CVD (UHV/CVD) .CVD inogona kushandiswawo senzira yekuwedzera simba rekubatsira, uye mazuvano zvakajairika zvinosanganisira plasma neCVDCVDhanced plasma neCVDCVDhanced (PCVD), nezvimwewo CVD inzira yekuisa gasi-chikamu.
CVD ndiyo nzira yekugadzira firimu umo gasi-chikamu chinhu chinoitwa nekemikari pakupisa kwakanyanya kuburitsa chinhu chakasimba chinoiswa pane substrate. Kunyanya, simbi inoputika halides kana simbi organic komisheni inosanganiswa neanotakura gasi senge H, Ar, kana N, uye zvadaro inotakurwa kuenda kune yakakwira-tembiricha substrate mukamuri yekupindura kuita firimu rakatetepa pane substrate kuburikidza nemakemikari reaction. Hazvina mhosva kuti ndeupi rudzi rweCVD, deposition inogona kuitwa zvinobudirira inofanira kusangana nemamiriro ezvinhu anotevera: Kutanga, mukupisa kwekushisa, zvinogadzirisa zvinofanira kuva nemhepo yakakwana yemhepo; Chechipiri, iyo reaction product, kuwedzera kune yaidiwa dhipoziti kune yakasimba mamiriro, iyo yakasara yegaseous state; Chechitatu, iyo dhipoziti pachayo inofanirwa kunge yakadzikira yakaderera mhute yekumanikidza kuti ive nechokwadi chekuti deposition reaction process inogona kuchengetwa mukuita kwese kweiyo inopisa substrate; Chechina, iyo substrate zvinhu inotakurwa zvakafanana kukamuri yekupindura pane substrate, kuburikidza nemakemikari reaction kuti iite firimu rakatetepa. Chechina, iyo vapor pressure ye substrate material pachayo inofanirawo kunge yakadzikira patembiricha yekuisa.
-Chinyorwa ichi chakaburitswa byvacuum coating machine mugadziriGuangdong Zhenhua
Nguva yekutumira: May-04-2024