Hoʻopiliʻia ka filament tungsten i kahi wela kiʻekiʻe e hoʻokuʻu i nā electron wela e hoʻokuʻu i kahi kahawai electron kiʻekiʻe, a ma ka manawa hoʻokahi i hoʻonohonohoʻia ka electrode accelerating e hoʻonui i nā electrons wela i loko o ke kahawai electron kiʻekiʻe. High-density, kiʻekiʻe-ikaika electron kahe hiki ke oi chlorine ionization, oi metala kiʻiʻoniʻoni papa atomi ionized e loaa hou chloride ion e hoʻomaikaʻi i ka sputtering rate, ma laila e hoʻonui i ka deposition rate: hiki ke oi metala ionization e hoʻomaikaʻi i ka metala ionization rate, conducive i ka hopena o ka deposition o ka hui kiʻiʻoniʻoni; metala kiʻiʻoniʻoni iions e hiki aku i ka workpiece e hoʻomaikaʻi i ka nui o kēia manawa o ka ʻāpana hana, ma laila e hoʻonui ai i ka helu deposition.
I loko o ka magnetron sputtering paʻakikī, Hoʻonui i ka nui o kēia manawa a me ka hui kiʻiʻoniʻoni o ka mea hana ma mua a ma hope o ka cathodizing wela. ʻO TiSiCN ma mua o ka hoʻohui ʻana o ka cathode wela, ʻo 0.2mA / mm ka nui o kēia manawa ma ka workpiece, ma hope o ka piʻi ʻana o ka cathode wela i 4.9mA / mm2, ua like ia me ka piʻi ʻana o 24 mau manawa a i ʻole, a ʻoi aku ka paʻakikī o ka hui kiʻiʻoniʻoni. Hiki ke 'ike 'ia ma ka magnetron sputtering coating technology, 'o ka ho'ohui 'ana i kahi cathode wela he mea maika'i loa ia i ka ho'omaika'i 'ana i ka nui o ka deposition magnetron sputtering a me ka hana o nā mea ki'i. Hiki i kēia ʻenehana ke hoʻomaikaʻi maikaʻi i ke ola o nā lau turbine, nā puʻu lepo lepo, a me nā ʻāpana wili.
-Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini hoʻopaʻa haʻahaʻaGuangdong Zhenhua
Ka manawa hoʻouna: Oct-11-2023