Eqinisweni, ubuchwepheshe be-Ion beam bokusiza ubuchwephesha obuhlanganisiwe.Kuyindlela yokwelapha ye-ion engaphezulu ehlanganisa ukufakwa kwe-ion kanye nobuchwepheshe befilimu bokufakwa komhwamuko, kanye nohlobo olusha lwesu le-ion beam surface optimization.Ngaphezu kwezinzuzo zokubeka umhwamuko obonakalayo, le nqubo ingaqhubeka ikhulisa noma iyiphi ifilimu ewugqinsi ngaphansi kwezimo eziqinile zokulawula, ithuthukise ukucwebezela nokuma kwesendlalelo sefilimu ngokuphawulekayo, yandise amandla okunamathela ongqimba/i-substrate yefilimu, ithuthukise ukuminyana. wesendlalelo sefilimu, futhi uhlanganise amafilimu ayinhlanganisela anezilinganiso ezifanele ze-stoichiometric endaweni eseduze negumbi lokushisa, okuhlanganisa nezinhlobo ezintsha zamafilimu angenakutholwa ekamelweni lokushisa nokucindezela.I-ion beam assisted deposition ayigcini nje ngokugcina izinzuzo zenqubo yokufakelwa kwe-ion, kodwa futhi ingamboza i-substrate ngefilimu ehluke ngokuphelele ku-substrate.
Kuzo zonke izinhlobo zokubeka umhwamuko obonakalayo kanye nokufakwa komhwamuko wamakhemikhali, isethi yezibhamu ezisizayo eziqhunyiswa ngamabhomu zingangezwa ukwenza uhlelo lwe-IBAD, futhi kunezinqubo ezimbili ezijwayelekile ze-IBAD njengokulandelayo, njengoba kukhonjisiwe ku-Pic:
Njengoba kubonisiwe ku-Pic (a), umthombo wokuhwamuka kwe-electron beam usetshenziselwa ukukhanyisela isendlalelo sefilimu ngothango lwe-ion olukhishwa kusibhamu se-ion, ngaleyo ndlela kuqashelwe ukubekwa kokusiza kwe-ion.Inzuzo yukuthi amandla e-ion beam kanye nesiqondiso kungashintshwa, kodwa i-alloy eyodwa noma elinganiselwe kuphela, noma i-compound ingasetshenziswa njengomthombo wokuhwamuka, futhi ingcindezi yomusi ngayinye yengxenye ye-alloy kanye nenhlanganisela ihlukile, okwenza kube nzima. ukuthola ungqimba lwefilimu lokuqanjwa komthombo wokuqala wokuhwamuka.
Isithombe (b) sibonisa i-ion beam sputtering-assisted deposition, eyaziwa nangokuthi i-double ion beam sputtering deposition, lapho okuqondiwe okwenziwe ngezinto zokumboza zokufafaza kwe-ion, imikhiqizo yokufafaza isetshenziswa njengomthombo.Ngenkathi uyifaka ku-substrate, ukufakwa kwe-ion beam sputtering kufinyelelwa ngokufaka imisebe ngomunye umthombo we-ion.Inzuzo yale ndlela ukuthi izinhlayiya ezihlutshiwe ngokwazo zinamandla athile, ngakho-ke kukhona ukunamathela okungcono ne-substrate;noma iyiphi ingxenye yethagethi ingaba yi-sputtered coating, kodwa futhi kungaba ukusabela okuphafuza efilimini, kulula ukulungisa ukwakheka kwefilimu, kodwa ukusebenza kahle kokubekwa kwayo kuphansi, okuhlosiwe kuyabiza futhi kunezinkinga ezifana nokuphalaza okukhethekile.
Isikhathi sokuthumela: Nov-08-2022