Eqinisweni, ubuchwepheshe bokufaka i-ion beam assisted deposition buwubuchwepheshe obuhlanganisiwe. Buyindlela yokwelapha i-ion surface ehlanganisiwe ehlanganisa ubuchwepheshe bokufaka i-ion kanye nobuchwepheshe befilimu yokufaka i-vapor ngokomzimba, kanye nohlobo olusha lwendlela yokwenza ngcono ubuso be-ion beam. Ngaphezu kwezinzuzo zokufaka i-vapor ngokomzimba, le ndlela ingakhula ngokuqhubekayo noma iyiphi ifilimu yobukhulu ngaphansi kwezimo zokulawula eziqinile, ithuthukise ukwakheka kwekristalu kanye nokuqondiswa kwengqimba yefilimu kakhulu, yandise amandla okunamathela kwengqimba/i-substrate yefilimu, ithuthukise ukujiya kwengqimba yefilimu, futhi ihlanganise amafilimu ahlanganisiwe anezilinganiso ezifanele ze-stoichiometric ekushiseni okuseduze kwegumbi, kufaka phakathi izinhlobo ezintsha zamafilimu ezingatholakali ekushiseni kwegumbi kanye nengcindezi. Ukufakwa kwe-ion beam assisted deposition akugcini nje ngokugcina izinzuzo zenqubo yokufaka i-ion, kodwa futhi kungamboza i-substrate ngefilimu ehluke ngokuphelele kwi-substrate.
Kuzo zonke izinhlobo zokufakwa komusi ongokoqobo kanye nokufakwa komusi wamakhemikhali, isethi yezibhamu ze-ion ezisizayo zingangezwa ukwakha uhlelo lwe-IBAD, futhi kunezinqubo ezimbili ezijwayelekile ze-IBAD kanje, njengoba kuboniswe ku-Pic:
Njengoba kuboniswe ku-Pic (a), umthombo wokuhwamuka komsebe we-electron usetshenziselwa ukukhanyisa ungqimba lwefilimu ngomsebe we-ion okhishwa yisibhamu se-ion, ngaleyo ndlela kutholakale ukubekwa okusizwa ngumsebe we-ion. Inzuzo ukuthi amandla nomkhombandlela we-ion beam kungalungiswa, kodwa i-alloy eyodwa noma elinganiselwe, noma i-compound ingasetshenziswa njengomthombo wokuhwamuka, futhi ingcindezi ngayinye yomhwamuko wengxenye ye-alloy kanye ne-compound ihlukile, okwenza kube nzima ukuthola ungqimba lwefilimu lokwakheka komthombo wokuhwamuka kokuqala.
Isithombe (b) sibonisa ukufakwa kwe-ion beam sputtering-assisted deposition, okwaziwa nangokuthi ukufakwa kwe-double ion beam sputtering deposition, lapho okuqondiwe kwenziwe ngezinto zokumboza ze-ion beam sputtering, imikhiqizo yokumpompa isetshenziswa njengomthombo. Ngenkathi ifakwa ku-substrate, ukufakwa kwe-ion beam sputtering assisted deposition kufezwa ngokushiswa ngemisebe ngomunye umthombo we-ion. Inzuzo yale ndlela ukuthi izinhlayiya ezimpompa ngokwazo zinamandla athile, ngakho-ke kukhona ukunamathela okungcono ku-substrate; noma iyiphi ingxenye ye-target ingaba yi-sputtered coating, kodwa futhi ingaba yi-reaction sputtering efilimini, kulula ukulungisa ukwakheka kwefilimu, kodwa ukusebenza kwayo kahle kokufakwa kuphansi, okuqondiwe kuyabiza futhi kunezinkinga ezifana nokumpompa okukhethayo.
Isikhathi sokuthunyelwe: Novemba-08-2022