Kutaura zvazviri, tekinoroji yeIon beam assisted deposition tekinoroji yecomposite. Iyi inzira yekurapa maion pamusoro pe composite inosanganisa tekinoroji ye ion implantation uye physical vapor deposition film, uye rudzi rutsva rwenzira ye ion beam surface optimization. Kuwedzera kune zvakanakira zve physical vapor deposition, nzira iyi inogona kuramba ichikura chero firimu rakakora pasi pemamiriro ekudzora akaomarara, kuvandudza crystallinity uye kurongeka kwefirimu layer zvakanyanya, kuwedzera simba rekunamatira kwefirimu layer/substrate, kuvandudza denseness yefirimu layer, uye kugadzira mafirimu akabatanidzwa ane stoichiometric ratios yakanaka patembiricha yemumba, kusanganisira mhando itsva dzemafirimu dzisingawanikwe patembiricha yemumba nekumanikidzwa. Ion beam assisted deposition haingochengetedzi zvakanakira maitiro e ion implantation, asi inogonawo kufukidza substrate nefirimu yakasiyana zvachose ne substrate.
Mumhando dzese dzekuisa mhute chaiyo uye kuisirwa kwemhute yemakemikari, seti yepfuti dzemabhombardment ion dzinogona kuwedzerwa kuti dzigadzire sisitimu yeIBAD, uye kune maitiro maviri eIBAD akajairika seanotevera, sezvakaratidzwa muPikicha:
Sezvakaratidzwa muPic (a), sosi ye evaporation ye electron beam inoshandiswa kuvhenekera firimu layer ne ion beam inoburitswa kubva mu ion gun, nokudaro zvichiita kuti ion beam ibate ibatsire kuisa. Chakanakira ndechekuti simba re ion beam negwara zvinogona kugadziriswa, asi alloy imwe chete kana ine muganho, kana compound inogona kushandiswa se evaporation source, uye vapor pressure yega yega ye alloy component ne compound yakasiyana, izvo zvinoita kuti zviome kuwana firimu layer ye evaporation source composition yekutanga.
Mufananidzo (b) unoratidza ion beam sputtering-assisted deposition, iyo inozivikanwawo se double ion beam sputtering deposition, umo chinangwa chakagadzirwa nezvinhu zve ion beam sputtering coating, zvigadzirwa zve sputtering zvinoshandiswa senzvimbo. Paunenge uchiisa pa substrate, ion beam sputtering assisted deposition inowanikwa nemwaranzi neimwe ion source. Chakanakira nzira iyi ndechekuti zvidimbu zve sputtered pachazvo zvine simba rakati, saka pane kunamira kuri nani ne substrate; chero chikamu chechinangwa chinogona kunge chiri sputtered coating, asiwo chinogona kunge chiri reaction sputtering mufirimu, zviri nyore kugadzirisa chimiro chefirimu, asi kushanda kwayo kwakaderera, chinangwa chinodhura uye kune matambudziko akadai sekusarudza sputtering.
Nguva yekutumira: Mbudzi-08-2022