Muchokwadi, Ion beam yakabatsira deposition tekinoroji tekinoroji inoumbwa.Iyo inoumbwa pamusoro ion kurapwa nzira inosanganisa ion kuisirwa uye yemuviri vapor deposition firimu tekinoroji, uye mhando nyowani yeion beam surface optimization maitiro.Pamusoro pezvakanakira zvekuisa mhute yemuviri, nzira iyi inogona kuramba ichikura chero firimu reukobvu pasi pemamiriro akasimba ekudzora, kuvandudza crystallinity uye kutaridzika kweiyo firimu layer zvakanyanya, kuwedzera kusimba kwekunamatira kweiyo firimu layer / substrate, kuvandudza denseness. yefirimu layer, uye gadzira mafirimu emukomboni ane akakodzera stoichiometric ratios padyo nekamuri tembiricha, kusanganisira mhando nyowani dzemafirimu dzisingawanikwe pakamuri tembiricha uye kumanikidza.Ion beam yakabatsira deposition haingochengete chete zvakanakira iyo ion implantation process, asi inogona zvakare kuvhara iyo substrate neyakasiyana firimu kubva kune substrate.
Mumhando dzese dzemuviri mhute deposition uye kemikari vapor deposition, seti yeayamura bombardment ion pfuti inogona kuwedzerwa kuumba IBAD system, uye kune maviri akajairwa IBAD maitiro anotevera, sezvakaratidzwa muPic:
Sezvinoratidzwa muPic (a), electron beam evaporation sosi inoshandiswa kuvhenekesa bhaisikopo nedanda reion rinoburitswa kubva mupfuti yeion, zvichibva zvaona kuti ion beam inobatsira kuiswa.Chakanakira ndechekuti iyo ion danda simba uye gwara rinogona kugadziridzwa, asi chete imwe chete kana shoma alloy, kana komisheni inogona kushandiswa seyo evaporation sosi, uye yega yega vapor pressure yealloy component necompound zvakasiyana, izvo zvinoita kuti zviome. kuwana iyo firimu layer yepakutanga evaporation source composition.
Pic (b) inoratidza iyo ion beam sputtering-assisted deposition, inozivikanwawo sedouble ion beam sputtering deposition, umo chinangwa chakagadzirwa neion beam sputtering coating material, sputtering products is used as the source.Paunenge uchiiisa pane substrate, ion beam sputtering yakabatsira deposition inowanikwa neradiation neimwe ion sosi.Kubatsira kweiyi nzira ndeyokuti sputtered particles ivo pachavo vane rimwe simba, saka pane zviri nani kunamatira ne substrate;chero chikamu chechinangwa chinogona kuputirwa, asi zvakare chinogona kunge chiri reaction sputtering mufirimu, zviri nyore kugadzirisa kuumbwa kwefirimu, asi dhizaini yaro yakaderera, chinangwa chinodhura uye pane matambudziko akadai sekusarudza sputtering.
Nguva yekutumira: Nov-08-2022