Ndipotu, ukadaulo wothandiza kuyika ma ion ndi ukadaulo wophatikizana. Ndi njira yopangira ma ion pamwamba yomwe imagwiritsa ntchito ukadaulo woyika ma ion ndi ukadaulo woika ma ion, komanso njira yatsopano yopangira ma ion pamwamba. Kuphatikiza pa ubwino woika ma ion pamwamba, njira iyi imatha kukulitsa filimu iliyonse yokhuthala pansi pa mikhalidwe yokhwima kwambiri, kupititsa patsogolo kristalo ndi mawonekedwe a filimuyo kwambiri, kuonjezera mphamvu yomatira ya filimuyo/substrate, kupititsa patsogolo kukhuthala kwa filimuyo, ndikupanga mafilimu okhala ndi ma stoichiometric ratios abwino kwambiri pa kutentha kwa chipinda, kuphatikiza mitundu yatsopano ya mafilimu omwe sangapezeke pa kutentha kwa chipinda ndi kupanikizika. Kuika ma ion pamwamba sikuti kumangosunga ubwino wa njira yoika ma ion, komanso kumatha kuphimba substrateyo ndi filimu yosiyana kwambiri ndi substrateyo.
Mu mitundu yonse ya kuyika nthunzi yeniyeni ndi kuyika nthunzi ya mankhwala, gulu la mfuti zothandizira za bombardment ion zitha kuwonjezeredwa kuti apange dongosolo la IBAD, ndipo pali njira ziwiri zazikulu za IBAD motere, monga momwe zasonyezedwera mu Chithunzi:
Monga momwe zasonyezedwera mu Chithunzi (a), gwero la evaporation la electron beam limagwiritsidwa ntchito kuunikira gawo la filimu ndi ion beam yotuluka kuchokera ku mfuti ya ion, motero kuzindikira ion beam yothandizidwa ndi kuyika. Ubwino wake ndi wakuti mphamvu ya ion beam ndi njira zitha kusinthidwa, koma alloy imodzi kapena yochepa, kapena compound yokha ndi yomwe ingagwiritsidwe ntchito ngati gwero la evaporation, ndipo kuthamanga kwa nthunzi kulikonse kwa gawo la alloy ndi compound ndi kosiyana, zomwe zimapangitsa kuti zikhale zovuta kupeza gawo la filimu la kapangidwe koyambirira ka evaporation source.
Chithunzi (b) chikuwonetsa kuyika kwa ion beam sputtering-assisted deposition, komwe kumadziwikanso kuti double ion beam sputtering deposition, momwe cholingacho chimapangidwa ndi zinthu zokutira za ion beam sputtering, zinthu zotulutsira zimagwiritsidwa ntchito ngati gwero. Mukayika pa substrate, ion beam sputtering assisted deposition imapezedwa ndi kuwala ndi gwero lina la ion. Ubwino wa njira iyi ndikuti tinthu totulutsira tokha tili ndi mphamvu inayake, kotero pali kugwirizana bwino ndi substrate; gawo lililonse la chandamale likhoza kukhala sputtered covering, komanso likhoza kukhala reaction sputtering mu filimu, yosavuta kusintha kapangidwe ka filimuyi, koma mphamvu yake yotulutsira ndi yochepa, chandamale ndi chokwera mtengo ndipo pali mavuto monga kusankha sputtering.
Nthawi yotumizira: Novembala-08-2022