Ebile, theknoloji ea Ion beam e thusitseng deposition ke theknoloji e kopaneng. Ke mokhoa o kopaneng oa kalafo oa ion o kopanyang ho kenngoa ha ion le theknoloji ea filimi ea ho beha mouoane oa 'mele, le mofuta o mocha oa mokhoa oa ion beam surface optimization. Ntle le melemo ea ho beha mouoane oa 'mele, mokhoa ona o ka tsoela pele ho hōlisa filimi leha e le efe ea botenya tlas'a maemo a thata a ho laola, ho ntlafatsa crystallinity le mokhoa oa ho shebella filimi haholo, ho eketsa matla a ho khomarela karolo ea filimi / substrate, ho ntlafatsa lesela la filimi, le ho kopanya lifilimi tse nang le likarolo tse loketseng tsa stoichiometric mocheso o haufi le mocheso oa kamoreng, ho kenyelletsa le mefuta e mecha ea khatello e ke keng ea fumanoa. Ion beam e thusitseng deposition ha e boloke feela melemo ea ts'ebetso ea ho kenngoa ha ion, empa e ka boela ea koahela substrate ka filimi e fapaneng ka ho felletseng le substrate.
Mefuteng eohle ea ho beha mouoane oa 'mele le ho beha mouoane oa lik'hemik'hale, sete ea lithunya tse thusang tsa bombardment ion li ka eketsoa ho theha sistimi ea IBAD, mme ho na le lits'ebetso tse peli tse akaretsang tsa IBAD tse latelang, joalo ka ha ho bonts'itsoe ho Pic:

Joalo ka ha ho bonts'itsoe ho Pic (a), mohloli oa elektrone beam evaporation o sebelisoa ho irradiate lera la filimi ka beam ea ion e hlahisoang ke sethunya sa ion, ka hona ho hlokomela hore ion beam e thusa ho beoa. Monyetla ke hore matla a ion beam le tataiso li ka fetoloa, empa motsoako o le mong kapa o lekanyelitsoeng, kapa motsoako o ka sebelisoa e le mohloli oa mouoane, 'me khatello e' ngoe le e 'ngoe ea mouoane ea motsoako oa motsoako le motsoako o fapane, e leng se etsang hore ho be thata ho fumana karolo ea filimi ea mohloli oa mohloli oa mouoane oa pele.
Pic (b) e bonts'a ion beam sputtering-assisted deposition, eo hape e tsejoang e le double ion beam sputtering deposition, eo ho eona sepheo se entsoeng ka thepa ea ion beam sputtering coating, lihlahisoa tsa sputtering li sebelisoa e le mohloli. Ha u ntse u e beha holim'a substrate, ion beam sputtering e thusa ho kenya letsoho ho finyelloa ka ho khantša mohloli o mong oa ion. Molemo oa mokhoa ona ke hore likaroloana tse sputtered ka botsona li na le matla a itseng, kahoo ho na le ho khomarela hantle le substrate; karolo efe kapa efe ea sepheo e ka ba sputtered barbotage, empa hape e ka ba karabelo sputtering ka filimi, ho le bonolo ho fetola sebopeho sa filimi, empa deposition ea eona e sebetsang hantle e tlaase, targeted e theko e boima 'me ho na le mathata a kang ho khetha sputtering.
Nako ea poso: Nov-08-2022
