Ho roala ha Magnetron sputtering ho etsoa ka phallo e khanyang, e nang le letsoalo le tlase la ho tsoa hona joale le letsoalo le tlase la plasma ka phaposing ea ho roala. Sena se etsa hore theknoloji ea magnetron sputtering e be le mefokolo e kang matla a tlase a substrate bonding force, sekhahla se tlase sa ionization ea tšepe, le sekhahla se tlase sa deposition. Mochineng oa ho roala magnetron sputtering, ho eketsoa sesebelisoa sa arc discharge, se ka sebelisang phallo ea elektronike e phahameng ka har'a plasma ea arc e hlahisoang ke arc discharge ho hloekisa workpiece, E ka boela ea kenya letsoho ho koaheleng le ho kenya letsoho ho thusang.
Eketsa mohloli oa matla a ho ntša arc mochining oa ho roala oa magnetron, e ka bang mohloli o monyane oa arc, mohloli oa li-rectangular planar arc, kapa mohloli oa cylindrical cathode arc. Phallo ea elektronike e phahameng haholo e hlahisoang ke mohloli oa cathode arc e ka bapala likarolo tse latelang ts'ebetsong eohle ea ho roala ha magnetron sputtering:
1. Hloekisa workpiece. Pele o roala, bulela mohloli oa cathode arc, joalo-joalo, ionize khase ka phallo ea elektronike ea arc, 'me u hloekise mosebetsi ka matla a tlaase le li-ion tsa argon tse phahameng.
2. Mohloli oa arc le sepheo sa ho laola matla a khoheli li koahetsoe hammoho. Ha sepheo sa magnetron sputtering se nang le khanya e khanyang se kentsoe bakeng sa ho roala, mohloli oa cathode arc o boetse oa kenngoa, 'me mehloli ka bobeli e koahetsoe ka nako e le' ngoe. Ha sebopeho sa magnetron sputtering target material and the arc source target material is different, multiple layers of film can be plated, and the film layer deposited by the cathode arc source is interlayer in the multi-layer film.
3. The cathode arc mohloli o fana ka phahameng segokanyipalo elektrone phallo ha ho kopanela barbotage, ho eketsa monyetla oa ho thulana le sputtered tšepe filimi lera liathomo le likhase itsoara joang, ho ntlafatsa sekhahla deposition, sekhahla tšepe ionization, le ho phetha karolo ea ho thusa deposition.
Mohloli oa cathode arc o hlophisitsoeng mochining oa ho roala oa magnetron o kopanya mohloli oa ho hloekisa, mohloli oa ho roala, le mohloli oa ionization, o bapala karolo e ntle ho ntlafatsa boleng ba magnetron sputtering coating ka ho sebelisa phallo ea elektronike ea arc ho plasma ea arc.
Nako ea poso: Jun-21-2023