Kuputira kweMagnetron kunoitwa mukubuda kwechiedza, nekudzikira kwesimba rekuburitsa mvura uye kudzikira kweplasma mukamuri rekuputira. Izvi zvinoita kuti tekinoroji yekuputira kweMagnetron ive nezvayakaipira zvakaita sekudzikira kwesimba rekusunga simbi, kudzikira kwesimbi, uye kudzikira kwesimba rekuburitsa mvura. Mumuchina wekuputira weMagnetron, mudziyo wekubuditsa mvura unowedzerwa, unogona kushandisa kuyerera kwemaerekitironi akawanda muplasma yearc inogadzirwa nekubuda kwearc kuchenesa workpiece, uye unogona zvakare kutora chikamu mukuputira uye kudzikira kwesimba rekubatsira.
Wedzera simba rekuburitsa arc mumuchina we magnetron sputtering coating, unogona kuva tsime diki re arc, rectangular planar arc source, kana cylindrical cathode arc source. Kuyerera kwemaerekitironi kwakawanda kunogadzirwa ne cathode arc source kunogona kuita mabasa anotevera mukuita kwese kwe magnetron sputtering coating:
1. Chenesa workpiece. Usati waisa pendi, vhura cathode arc source, nezvimwewo, isa ionize gasi ne arc electron flow, uye chenesa workpiece nesimba shoma uye high density argon ions.
2. Chinongedzo che arc source ne magnetic control target zvakabatanidzwa. Kana chinongedzo che magnetron sputtering chine glow discharge chashandiswa kuti chifukidzwe, chinongedzo che cathode arc chinoshandawo, uye zvese zvinongedzo zve coating zvinofukidzwa panguva imwe chete. Kana kuumbwa kwezvinhu zve magnetron sputtering target nezvinhu zve arc source zvakasiyana, zvidimbu zvakawanda zvefirimu zvinogona kuputirwa, uye firimu rakaiswa ne cathode arc source rinenge riri interlayer mu multi-layer film.
3. Nzvimbo ye cathode arc inopa maerekitironi akawanda kana ichibatanidzwa mukuputira, zvichiwedzera mukana wekusangana nemaatomu esimbi ane sputtered film layer nemagasi e reaction, zvichivandudza mwero wekuiswa kwesimbi, mwero we ionization yesimbi, uye zvichibatsira mukuisa.
Sosi ye cathode arc yakagadzirwa mumuchina we magnetron sputtering coating inobatanidza sosi yekuchenesa, sosi ye coating, uye sosi ye ionization, zvichiita basa rakanaka mukuvandudza mhando ye magnetron sputtering coating nekushandisa arc electron flow mu arc plasma.
Nguva yekutumira: Chikumi-21-2023