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Izindlela Zokucubungula Zokuthuthukisa Amandla Emishini Yesendlalelo Sefilimu

Umthombo we-athikili:I-vacuum ye-Zhenhua
Funda:10
Kushicilelwe:24-05-04

Izakhiwo zemishini yongqimba lwe-membrane zithinteka ngokunamathela, ukucindezeleka, ukuminyana kokuhlanganisa, njll. Kusukela ebudlelwaneni phakathi kwezinto ezibonakalayo ze-membrane layer kanye nezici zenqubo, kungabonakala ukuthi uma sifuna ukuthuthukisa amandla omshini we-membrane ungqimba, kufanele sigxile kumingcele yenqubo elandelayo:

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(1) izinga le-vacuum. I-vacuum ekusebenzeni kwefilimu isobala kakhulu. Iningi lezinkomba zokusebenza zesendlalelo sefilimu zincike kakhulu ezingeni le-vacuum. Ngokuvamile, njengoba i-vacuum degree ikhula, ukuminyana kwefilimu kuyanda, ukuqina kuyanda, isakhiwo sefilimu siyathuthukiswa, ukwakheka kwamakhemikhali kuba msulwa, kodwa ngesikhathi esifanayo ukucindezeleka kuyanda.

(2) Izinga lokubeka imali. Thuthukisa izinga lokubeka hhayi kuphela elingasetshenziswa ukuze kuthuthukiswe izinga lokuhwamuka, okungukuthi, ukwandisa indlela yokushisa yomthombo wokuhwamuka, ingasetshenziswa futhi ukuze kwandiswe indlela yendawo yomthombo wokuhwamuka ukuze kuzuzwe, kodwa ukusetshenziswa komthombo wokuhwamuka ukwandisa izinga lokushisa kwendlela kunezithiyo zayo: yenza ukucindezeleka kongqimba lwe-membrane kukhulu kakhulu; Igesi eyenza ifilimu kulula ukubola. Ngakho-ke ngezinye izikhathi ukwandisa indawo yomthombo wokuhwamuka kunokuthuthukisa izinga lokushisa lomthombo wokuhwamuka kungcono kakhulu.

(3) izinga lokushisa le-substrate. Ukwandisa izinga lokushisa le-substrate kuvumelana ne-adsorption ebusweni be-substrate yama-molecule egesi asele ukuze akhiphe, ukwandisa i-substrate namandla okubopha phakathi kwama-molecule afakwe: ngesikhathi esifanayo kuzokhuthaza ukuguqulwa kokukhangiswa komzimba ku-adsorption yamakhemikhali, kuthuthukise ukusebenzisana phakathi kwama-molecule, ukuze isakhiwo sengqimba ye-membrane siqine. Isibonelo, i-Mg, i-membrane, ukushisa kwe-substrate kuya ku-250 ~ 300 ℃ kunganciphisa ukucindezeleka kwangaphakathi, kuthuthukise ukuminyana kwe-aggregation, kwandise ubulukhuni bongqimba lwe-membrane: ukushisa kwe-substrate kuya ku-120 ~ 150 ℃ okulungiselelwe i-Zr03-Si02, ulwelwesi lwama-multilayer, amandla ayo omshini akhuphuke kakhulu, kodwa ungqimba oluphezulu lwe-substrate luzobangela ulwelwesi oluphezulu kakhulu.

(4) Ukuqhuma kwe-ion. Ukuqhuma kwamabhomu e-ion kunomthelela ekwakhekeni kwezindawo ezihlangene kakhulu, ukuhwaqeka kwendawo, i-oxidation kanye nokuminyana kokuhlanganisa. Ukuqhuma kwamabhomu ngaphambi kokugqoka kungahlanza indawo futhi kwandise ukunamathela; ukuqhuma kwamabhomu ngemva kokumboza kungathuthukisa ukuminyana kongqimba lwefilimu, njll., ngaleyo ndlela kwandise amandla emishini nobulukhuni.

(5) Ukuhlanza i-substrate. Indlela yokuhlanza i-substrate ayilungile noma ayihlanzekile, ku-substrate ukungcola okusele noma i-ejenti yokuhlanza, bese ibangela ukungcola okusha, ekuhlanganiseni izimo ezihlukene zokubumbana nokunamathela, okuthinta ungqimba lokuqala lwezakhiwo zesakhiwo kanye nokushuba okubonakalayo, kodwa futhi wenze ungqimba lwefilimu lube lula ukuphuma ku-substrate, ngaleyo ndlela uguqule izici zongqimba lwefilimu.

-Le ndatshana ikhishwe nguumenzi womshini we-vacuum coatingI-Guangdong Zhenhua


Isikhathi sokuthumela: May-04-2024