Iimpawu zoomatshini zomaleko we-membrane zichaphazeleka kukunamathela, uxinzelelo, uxinano lokuhlanganiswa, njl. Ukusuka kubudlelwane phakathi kwezinto zomaleko we-membrane kunye nezinto zenkqubo, kunokubonwa ukuba ukuba sifuna ukuphucula amandla oomatshini womaleko we-membrane, kufuneka sigxile kwezi parameter zenkqubo zilandelayo:
(1) inqanaba le-vacuum. I-vacuum ekusebenzeni kwefilimu icacile kakhulu. Uninzi lwezalathisi zokusebenza zomaleko wefilimu zixhomekeke kakhulu kwinqanaba le-vacuum. Ngokwesiqhelo, njengoko inqanaba le-vacuum lisanda, uxinano lwefilimu luyanda, ukuqina kuyanda, ulwakhiwo lwefilimu luyaphucuka, ukwakheka kweekhemikhali kuba msulwa, kodwa kwangaxeshanye uxinzelelo nalo luyanda.
(2) Izinga lokukhupha. Ukuphucula izinga lokukhupha akupheleli nje ekuphuculeni izinga lokuphuma komphunga, oko kukuthi, ukwandisa indlela yobushushu bomthombo wokuphuma komphunga, kungasetyenziselwa ukwandisa indlela yokufikelela kwindawo yomthombo wokuphuma komphunga, kodwa ukusetyenziswa komthombo wokuphuma komphunga ukwandisa ubushushu bendlela kuneengxaki zako: ukwenza uxinzelelo lwe-membrane layer lube lukhulu kakhulu; igesi eyenza ifilimu kulula ukuyibola. Ngoko ke ngamanye amaxesha ukwandisa indawo yomthombo wokuphuma komphunga kunokuphucula ubushushu bomthombo wokuphuma komphunga kungcono.
(3) ubushushu be-substrate. Ukunyusa ubushushu be-substrate kuyanceda ekufakweni komphezulu we-substrate wee-molecule zegesi eziseleyo ukuze kukhutshwe, kwandiswe i-substrate kunye namandla okubopha phakathi kwee-molecule ezigciniweyo: kwangaxeshanye kuya kukhuthaza ukuguqulwa kwe-adsorption ebonakalayo kwi-chemical adsorption, kuphuculwe ukusebenzisana phakathi kwee-molecule, ukuze isakhiwo se-membrane layer sibe qinile. Umzekelo, i-Mg, i-membrane, i-substrate heating ukuya kwi-250 ~ 300 ℃ inokunciphisa uxinzelelo lwangaphakathi, iphucule uxinano lokuhlanganiswa, inyuse ubunzima be-membrane layer: i-substrate heating ukuya kwi-120 ~ 150 ℃ elungisiweyo i-Zr03-Si02, i-multilayer membrane, amandla ayo oomatshini anyuke kakhulu, kodwa ubushushu be-substrate buphezulu kakhulu buya kubangela ukonakala kwe-membrane layer.
(4) Ukuqhushumba kwe-ion. Ukuqhushumba kwe-ion kunefuthe ekwakhiweni kwemiphezulu edibeneyo kakhulu, uburhabaxa bomphezulu, ukuxinana kwe-oxidation kunye noxinano lokuhlanganiswa. Ukuqhushumba ngaphambi kokugquma kunokucoca umphezulu kwaye konyuse ukunamathela; ukuqhushumba emva kokugquma kunokuphucula uxinano lokuhlanganiswa komaleko wefilimu, njl.njl., ngaloo ndlela kwandisa amandla oomatshini kunye nobunzima.
(5) Ukucoca i-substrate. Indlela yokucoca i-substrate ayifanelekanga okanye ayicocekanga, kwi-substrate kukho ukungcola okushiyekileyo okanye i-arhente yokucoca, emva koko kubangele ungcoliseko olutsha, kwi-coating yeemeko ezahlukeneyo zokudibanisa kunye nokunamathela, okuchaphazela umaleko wokuqala weempawu zesakhiwo kunye nobukhulu be-optical, kodwa kwakhona kwenza umaleko wefilimu kube lula ukuphuma kwi-substrate, ngaloo ndlela kutshintsha iimpawu zomaleko wefilimu.
–Eli nqaku likhutshwe nguumenzi womatshini wokugquma nge-vacuumGuangdong Zhenhua
Ixesha leposi: Meyi-04-2024