1. Ion danda rinobatsira deposition tekinoroji inoratidzirwa nekunamatira kwakasimba pakati pe membrane uye substrate, iyo membrane layer yakasimba kwazvo. Ongororo dzinoratidza kuti: ion beam-inobatsira deposition yekunamatira pane kunamatira kwehutsi hwemhepo deposition yakawedzera kakawanda kusvika kumazana enguva, chikonzero chinonyanya kukonzerwa neiyoni bombardment pamusoro peiyo yekuchenesa maitiro, kuitira kuti membrane base interface iite gradient interfacial chimiro, kana hybrid transition layer, pamwe nekuderedza kushushikana kwe membrane.
2. Ion danda rinobatsira deposition rinogona kuvandudza michina yefirimu, kuwedzera kuneta hupenyu, yakanyatsokodzera kugadzirwa kwemaokisi, carbides, cubic BN, TiB2, uye madhaimondi-akafanana majasi. Semuenzaniso, mu1Cr18Ni9Ti simbi inodzivirira kupisa pakushandiswa kweion-beam-yakabatsira deposition tekinoroji kukura 200nm Si3N4 firimu, kwete chete inogona kutadzisa kubuda kwekuneta kutsemuka pamusoro pechinhu, asiwo zvakanyanya kuderedza chiyero chekuneta kutsemuka kupararira, kuwedzera hupenyu hwayo kune basa rakanaka.
3. Ion danda rinobatsira deposition rinogona kuchinja kushushikana kwefirimu uye chimiro chayo chekristalline chinoshanduka. Semuenzaniso, kugadzirira kweCr firimu ine 11.5keV Xe + kana Ar + bombardment ye substrate pamusoro, yakaona kuti kugadziridzwa kweiyo substrate tembiricha, bombardment ion simba, ion uye maatomu kuti asvike reshiyo yemaparamita, anogona kuita kushushikana kubva mukushushikana kwekumanikidza kuenda kune compression kushushikana, iyo crystalline chimiro chemufirimu chichaunzawo shanduko. Pasi peimwe ion-ku-atomu yekusvika reshiyo, danda reion rinobatsira deposition rine sarudzo iri nani pane iyo membrane layer inoiswa ne thermal vapor deposition.
4.Ion danda rinobatsira deposition rinogona kuwedzera kusimba kwekuora uye oxidation kuramba kwe membrane. Nekuda kwekuwanda kweiyo ion beam-yakabatsirwa kuiswa kweiyo firimu layer, iyo firimu base interface gadziriso yekuvandudza kana kuumbwa kweamorphous state kunokonzerwa nekutsakatika kwemiganhu yezviyo pakati pezvimedu, izvo zvinobatsira mukusimudzira kusimba kwekushomeka kwechinhu uye kuramba oxidation yekupisa kwakanyanya.
5. Ion danda rinobatsira deposition rinogona kushandura magetsi emagetsi emufirimu uye kugadzirisa kushanda kwemafirimu akaonda matete.
6. Ion-assisted deposition inobvumira kunyatsogadzirisa uye yakazvimirira kugadziriswa kwemiganhu ine chokuita neatomic deposition uye ion implantation, uye inobvumira kutevedzana kwechizvarwa chekuputira kwema micrometer mashomanana ane maitiro anowirirana pamagetsi ebhombardment yakaderera, kuitira kuti mafirimu akaonda akasiyana-siyana anogona kukura pakupisa kwekamuri, kudzivisa migumisiro yakaipa pane zvinhu kana kukonzerwa nekugadzirisa kwekushisa kwezvikamu zvingave zvakakonzerwa nekugadzirisa kwekushisa kwepamusoro.
-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua
Nguva yekutumira: Jan-24-2024