1. Ion beam assisted deposition technology is characterized by strong adhesion between the membrane and the substrate, the membrane layer is very strong. Experiments show that: ion beam-assisted deposition of adhesion than the adhesion of thermal vapor deposition increased several times to hundreds of times, the reason is mainly due to the ion bombardment on the surface of the cleaning effect, so that the membrane base interface to form a gradient interfacial structure, or hybrid transition layer, as well as to reduce the membrane stress.
2. Ion beam assisted deposition can improve the mechanical properties of the film, extend fatigue life, very suitable for the preparation of oxides, carbides, cubic BN, TiB2, and diamond-like coatings. For example, in 1Cr18Ni9Ti heat-resistant steel on the use of ion-beam-assisted deposition technology to grow 200nm Si3N4 film, not only can inhibit the emergence of fatigue cracks on the surface of the material, but also significantly reduce the rate of fatigue crack diffusion, to extend its life has a good role.
3. Ion beam assisted deposition can change the stress nature of the film and its crystalline structure changes. For example, the preparation of Cr film with 11.5keV Xe + or Ar + bombardment of the substrate surface, found that the adjustment of the substrate temperature, bombardment ion energy, ions and atoms to reach the ratio of parameters, can make the stress from tensile stress to compressive stress, the crystalline structure of the film will also produce changes. Under a certain ion-to-atom arrival ratio, the ion beam assisted deposition has better selective orientation than the membrane layer deposited by thermal vapor deposition.
4.Ion beam assisted deposition can enhance the corrosion resistance and oxidation resistance of the membrane. Due to the density of the ion beam-assisted deposition of the film layer, the film base interface structure improvement or the formation of amorphous state caused by the disappearance of the grain boundaries between the particles, which is conducive to the enhancement of the corrosion resistance of the material and resist the oxidation of high temperature.
5. Ion beam assisted deposition can change the electromagnetic properties of the film and improve the performance of optical thin films.
6. Ion-assisted deposition allows precise and independent adjustment of the parameters related to atomic deposition and ion implantation, and allows for the successive generation of coatings of a few micrometers with consistent composition at low bombardment energies, so that various thin films can be grown at room temperature, avoiding the adverse effects on materials or precision parts that may be caused by treating them at elevated temperatures.
–This article is released by vacuum coating machine manufacturer Guangdong Zhenhua
Post time: Jan-24-2024