Chemical Vapor Deposition (CVD) technology is a film-forming technology that uses heating, plasma enhancement, photo-assisted and other means to make gaseous substances produce solid films on the substrate surface through chemical reaction under normal or low pressure.
Generally, the reaction in which the reactant is a gas and one of the products is a solid is called CVD reaction. There are many kinds of coatings prepared by CVD reaction, especially in semiconductor process. For example, in the semiconductor field, the refining of raw materials, the preparation of high-quality semiconductor single crystal films, and the growth of polycrystalline and amorphous films, from electronic devices to integrated circuits, are all related to CVD technology. In addition, the surface treatment of materials is favored by people. For example, various materials such as machinery, reactor, aerospace, medical and chemical equipment can be used to prepare functional coatings with corrosion resistance, heat resistance, wear resistance and surface strengthening by CVD film forming method according to their different requirements.
—— This article is published by Guangdong Zhenhua, a manufacturer of vacuum coating equipment
Post time: Mar-04-2023