ʻO ka ʻenehana Chemical Vapor Deposition (CVD) kahi ʻenehana hana kiʻiʻoniʻoni e hoʻohana ana i ka hoʻomehana, ka hoʻonui ʻana i ka plasma, ke kōkua ʻana i ke kiʻi a me nā ʻano ʻē aʻe e hana ai i nā mea kinoea e hana i nā kiʻiʻoniʻoni paʻa ma ka ʻili o ka substrate ma o ka hopena kemika ma lalo o ke kaomi maʻamau a haʻahaʻa paha.
Ma keʻano laulā, ʻo ka hopena kahi he kinoea ka mea hana a ʻo kekahi o nā huahana he paʻa i kapa ʻia ʻo CVD reaction. Nui nā ʻano uhi i hoʻomākaukau ʻia e ka hopena CVD, ʻoi aku hoʻi i ke kaʻina hana semiconductor. No ka laʻana, ma ke kahua semiconductor, ʻo ka hoʻomaʻemaʻe ʻana i nā mea maka, ka hoʻomākaukau ʻana i nā kiʻiʻoniʻoni semiconductor kiʻekiʻe kiʻekiʻe, a me ka ulu ʻana o nā kiʻiʻoniʻoni polycrystalline a me amorphous, mai nā mea uila a i nā kaapuni i hoʻohui ʻia, e pili ana i ka ʻenehana CVD. Eia kekahi, makemake nui ʻia ka mālama ʻana i ka ʻili o nā mea e ka poʻe. No ka laʻana, hiki ke hoʻohana ʻia nā mea like ʻole e like me ka mīkini, reactor, aerospace, nā lako lapaʻau a me nā kemika e hoʻomākaukau i nā uhi hana me ke kūpaʻa i ka palaho, ke kūpaʻa wela, ke kūpaʻa ʻaʻahu a me ka hoʻoikaika ʻana i ka ʻili e ke ʻano hana kiʻiʻoniʻoni CVD e like me kā lākou mau koi like ʻole.
—— Ua paʻi ʻia kēia ʻatikala e Guangdong Zhenhua, kahi mea hana onā lako hana uhi vacuum
Ka manawa hoʻouna: Malaki-04-2023