Itekhnoloji yeChemical Vapor Deposition (CVD) yitekhnoloji yokwenza ifilimu esebenzisa ubushushu, ukuphuculwa kweplasma, ukuncediswa yifoto kunye nezinye iindlela zokwenza izinto zegesi zivelise iifilimu eziqinileyo kumphezulu wesiseko ngokusebenzisa i-chemical reaction phantsi koxinzelelo oluqhelekileyo okanye oluphantsi.
Ngokubanzi, indlela esebenza ngayo i-reactant yigesi kwaye enye yeemveliso iyinto eqinileyo ibizwa ngokuba yi-CVD reaction. Kukho iintlobo ezininzi zeengubo ezilungiselelwe yi-CVD reaction, ngakumbi kwinkqubo ye-semiconductor. Umzekelo, kwicandelo le-semiconductor, ukucocwa kwezinto eziluhlaza, ukulungiswa kweefilimu ze-semiconductor single crystal ezikumgangatho ophezulu, kunye nokukhula kweefilimu ze-polycrystalline kunye ne-amorphous, ukusuka kwizixhobo ze-elektroniki ukuya kwiisekethe ezidibeneyo, zonke zinxulumene netekhnoloji ye-CVD. Ukongeza, unyango lomphezulu wezinto luyathandwa ngabantu. Umzekelo, izixhobo ezahlukeneyo ezifana noomatshini, i-reactor, i-aerospace, izixhobo zonyango kunye neekhemikhali zingasetyenziselwa ukulungiselela iingubo ezisebenzayo ezinokumelana nokugqwala, ukumelana nobushushu, ukumelana nokuguguleka kunye nokuqiniswa komphezulu ngendlela yokwenza ifilimu ye-CVD ngokweemfuno zazo ezahlukeneyo.
—— Eli nqaku lipapashwe nguGuangdong Zhenhua, umenzi weizixhobo zokugquma nge-vacuum
Ixesha lokuthumela: Matshi-04-2023