Ubuchwepheshe be-Chemical Vapor Deposition (CVD) buwubuchwepheshe bokwenza ifilimu obusebenzisa ukushisa, ukuthuthukiswa kwe-plasma, ukusizwa ngesithombe kanye nezinye izindlela zokwenza izinto zegesi zikhiqize amafilimu aqinile ebusweni be-substrate ngokusebenzisa ukusabela kwamakhemikhali ngaphansi kwengcindezi evamile noma ephansi.
Ngokuvamile, ukusabela lapho i-reactant iyigesi futhi omunye wemikhiqizo uyi-solid kubizwa ngokuthi i-CVD reaction. Kunezinhlobo eziningi zokugqoka ezilungiselelwe yi-CVD reaction, ikakhulukazi enqubweni ye-semiconductor. Isibonelo, ensimini ye-semiconductor, ukuhluzwa kwezinto zokusetshenziswa, ukulungiswa kwamafilimu e-semiconductor single crystal asezingeni eliphezulu, kanye nokukhula kwamafilimu e-polycrystalline kanye ne-amorphous, kusukela kumadivayisi kagesi kuya kumasekethe ahlanganisiwe, konke kuhlobene nobuchwepheshe be-CVD. Ngaphezu kwalokho, ukwelashwa kwendawo yezinto kuthanda abantu. Isibonelo, izinto ezahlukahlukene ezifana nemishini, i-reactor, i-aerospace, imishini yezokwelapha kanye neyamakhemikhali zingasetshenziswa ukulungiselela ukugqoka okusebenzayo okunokumelana nokugqwala, ukumelana nokushisa, ukumelana nokuguguleka kanye nokuqinisa indawo ngendlela yokwakha ifilimu ye-CVD ngokwezidingo zazo ezahlukene.
—— Lesi sihloko sishicilelwe yiGuangdong Zhenhua, umenzi weimishini yokumboza nge-vacuum
Isikhathi sokuthunyelwe: Mashi-04-2023