Tekinoroji yeChemical Vapor Deposition (CVD) itekinoroji yekugadzira firimu inoshandisa kupisa, kuvandudza plasma, foto-assisted nedzimwe nzira dzekugadzira zvinhu zvine gasi kugadzira firimu rakasimba pamusoro pe substrate kuburikidza nekuita kwemakemikari pasi pekumanikidzwa kwakajairika kana kwakaderera.
Kazhinji, maitiro ayo reactant iri gasi uye chimwe chezvigadzirwa chiri chakasimba chinonzi CVD reaction. Kune marudzi akawanda ezvipfeko zvinogadzirwa neCVD reaction, kunyanya mukuita kwe semiconductor. Semuenzaniso, mumunda we semiconductor, kunatswa kwezvinhu zvakagadziriswa, kugadzirira mafirimu emhando yepamusoro e semiconductor single crystal, uye kukura kwemafirimu e polycrystalline neamorphous, kubva kumidziyo yemagetsi kusvika kuma circuits akabatanidzwa, zvese zvine chekuita netekinoroji yeCVD. Pamusoro pezvo, kurapwa kwepamusoro kwezvinhu kunodiwa nevanhu. Semuenzaniso, zvinhu zvakasiyana-siyana zvakaita semichina, reactor, aerospace, medical and chemical equipment zvinogona kushandiswa kugadzirira machira anoshanda ane resistance corrosion, resistance heat, resistance wear and surface strength neCVD film forming method zvichienderana nezvinodiwa zvavo zvakasiyana.
—— Chinyorwa ichi chakaburitswa naGuangdong Zhenhua, mugadziri wemidziyo yekunamira ye vacuum
Nguva yekutumira: Kurume-04-2023