Kev siv tshuab Chemical Vapor Deposition (CVD) yog ib txoj kev siv tshuab ua zaj duab xis uas siv cua sov, plasma enhancement, photo-assisted thiab lwm yam los ua kom cov pa roj tsim cov zaj duab xis khov kho rau ntawm qhov chaw substrate los ntawm kev tshuaj lom neeg hauv qab qhov siab ib txwm lossis qis.
Feem ntau, cov tshuaj tiv thaiv uas cov tshuaj reactant yog roj thiab ib qho ntawm cov khoom yog khoom khov hu ua CVD tshuaj tiv thaiv. Muaj ntau hom txheej txheej uas tau npaj los ntawm CVD tshuaj tiv thaiv, tshwj xeeb tshaj yog hauv cov txheej txheem semiconductor. Piv txwv li, hauv thaj chaw semiconductor, kev ua kom cov khoom siv raw, kev npaj cov yeeb yaj kiab semiconductor zoo, thiab kev loj hlob ntawm cov yeeb yaj kiab polycrystalline thiab amorphous, los ntawm cov khoom siv hluav taws xob mus rau cov voj voog sib xyaw, yog txhua yam cuam tshuam nrog CVD thev naus laus zis. Tsis tas li ntawd, kev kho qhov chaw ntawm cov ntaub ntawv yog nyiam los ntawm tib neeg. Piv txwv li, ntau yam khoom siv xws li tshuab, reactor, aerospace, khoom siv kho mob thiab tshuaj lom neeg tuaj yeem siv los npaj cov txheej txheej ua haujlwm nrog kev tiv thaiv corrosion, tiv thaiv kub, hnav tsis kam thiab kev txhawb nqa ntawm qhov chaw los ntawm CVD zaj duab xis tsim txoj kev raws li lawv cov kev xav tau sib txawv.
—— Tsab xov xwm no yog luam tawm los ntawm Guangdong Zhenhua, lub chaw tsim khoom ntawmcov khoom siv nqus tsev txheej
Lub sijhawm tshaj tawm: Lub Peb Hlis-04-2023