Theknoloji ea Chemical Vapor Deposition (CVD) ke theknoloji ea ho etsa lifilimi e sebelisang mocheso, ntlafatso ea plasma, thuso ea lifoto le mekhoa e meng ea ho etsa hore lintho tse nang le khase li hlahise lifilimi tse tiileng holim'a substrate ka karabelo ea lik'hemik'hale tlas'a khatello e tloaelehileng kapa e tlaase.
Ka kakaretso, karabelo eo ho eona reactant e leng khase mme e 'ngoe ea lihlahisoa e tiile e bitsoa CVD reaction.Ho na le mefuta e mengata ea liphahlo tse lokiselitsoeng ke karabelo ea CVD, haholo ts'ebetsong ea semiconductor.Ka mohlala, tšimong ea semiconductor, ho hloekisoa ha lihlahisoa tse tala, ho lokisoa ha lifilimi tsa boleng bo phahameng ba semiconductor single crystal, le ho hōla ha lifilimi tsa polycrystalline le amorphous, ho tloha lisebelisoa tsa elektronike ho ea ho lipotoloho tse kopantsoeng, kaofela li amana le theknoloji ea CVD.Ho phaella moo, phekolo ea holim'a thepa e ratoa ke batho.Ka mohlala, lisebelisoa tse fapa-fapaneng tse kang mechine, mochine, sefofane, lisebelisoa tsa bongaka le tsa lik'hemik'hale li ka sebelisoa ho lokisetsa liaparo tse sebetsang ka ho hanyetsa kutu, ho hanyetsa mocheso, ho hanyetsa le ho matlafatsa holim'a metsi ka mokhoa oa ho etsa filimi ea CVD ho latela litlhoko tsa bona tse fapaneng.
—— Sengoliloeng sena se hatisitsoe ke Guangdong Zhenhua, moetsi oalisebelisoa tsa ho roala ka vacuum
Nako ea poso: Mar-04-2023