Fasahar Kemikal ta Vapor Deposition (CVD) fasaha ce ta samar da fim wadda ke amfani da dumama, haɓaka plasma, taimakon hoto da sauran hanyoyi don sanya abubuwan da ke haifar da iskar gas su samar da fina-finai masu ƙarfi a saman substrate ta hanyar amsawar sinadarai a ƙarƙashin matsin lamba na yau da kullun ko ƙarancin matsin lamba.
Gabaɗaya, amsawar da mai amsawar iskar gas ce kuma ɗayan samfuran mai ƙarfi ana kiranta da CVD reaction. Akwai nau'ikan rufi da yawa da aka shirya ta hanyar CVD reaction, musamman a cikin tsarin semiconductor. Misali, a cikin filin semiconductor, tace kayan masarufi, shirya fina-finan kristal guda ɗaya na semiconductor mai inganci, da haɓaka fina-finan polycrystalline da amorphous, daga na'urorin lantarki zuwa da'irori masu haɗawa, duk suna da alaƙa da fasahar CVD. Bugu da ƙari, maganin saman kayan yana da fifiko ga mutane. Misali, ana iya amfani da kayan aiki daban-daban kamar injina, reactor, jiragen sama, kayan aikin likita da sinadarai don shirya rufin aiki tare da juriyar tsatsa, juriyar zafi, juriyar lalacewa da ƙarfafa saman ta hanyar hanyar samar da fim ɗin CVD bisa ga buƙatunsu daban-daban.
—— An buga wannan labarin ne daga Guangdong Zhenhua, wani kamfanin kera na'urorinkayan aikin shafa injin
Lokacin Saƙo: Maris-04-2023