Teknụzụ nkwụnye ego ion Beam nyere aka

1. Ion doo aka deposition technology e ji ike adhesion n'etiti akpụkpọ ahụ na mkpụrụ, na akpụkpọ ahụ oyi akwa dị ike nke ukwuu. Nlele na-egosi na: ion beam-enyere ntinye nke adhesion karịa adhesion nke thermal vepor deposition mụbara ọtụtụ ugboro ka ọtụtụ narị ugboro, ihe kpatara ya bụ tumadi n'ihi na ion bombardment n'elu nke ihicha mmetụta, nke mere na membrane base interface na-etolite a gradient interfacial Ọdịdị, ma ọ bụ ngwakọ mgbanwe oyi akwa, nakwa dị ka ibelata akpụkpọ ahụ nrụgide.

2. Ion beam nyeere deposition nwere ike melite n'ibu Njirimara nke film, ịgbatị ike ọgwụgwụ ndụ, nnọọ adabara maka nkwadebe nke oxides, carbides, cubic BN, TiB2, na diamond-dị ka coatings. Dị ka ihe atụ, na 1Cr18Ni9Ti okpomọkụ na-eguzogide ígwè na ojiji nke ion-beam-enyere deposition technology na-eto eto 200nm Si3N4 film, ọ bụghị nanị na nwere ike igbochi ntoputa nke ike ọgwụgwụ cracks n'elu nke ihe onwunwe, ma budata belata ọnụego nke ike ọgwụgwụ mgbape mgbasa, ịgbatị ndụ ya nwere ezigbo ọrụ.

3. Ion beam nyeere ntinye aka nwere ike ịgbanwe ọdịdị nrụgide nke ihe nkiri ahụ na ọdịdị kristal ya na-agbanwe. Dị ka ihe atụ, nkwadebe nke Cr film na 11.5keV Xe + ma ọ bụ Ar + bombardment nke mkpụrụ n'elu, chọpụtara na ukpụhọde nke substrate okpomọkụ, bombardment ion ume, ion na atọm iru ruru nke parameters, nwere ike ime ka nrụgide si tensile nrụgide na mkpakọ mkpakọ, na crystalline Ọdịdị nke ihe nkiri ahụ ga-emepụtakwa mgbanwe. N'okpuru ụfọdụ mbata ion-to-atom, nkwụnye ego enyere ion beam aka nwere ntụzịaka nhọrọ dị mma karịa oyi akwa akpụkpọ anụ nke etinyere nkuku ọkụ.

4.Ion beam na-enyere aka nkwụnye ego nwere ike welie ihe mgbochi corrosion na nkwụsị oxidation nke akpụkpọ ahụ. N'ihi njupụta nke ion doo-enyere deposition nke film oyi akwa, ihe nkiri isi interface Ọdịdị mma ma ọ bụ guzobe amorphous ala mere site n'iyi nke ọka ókè n'etiti ahụ, nke bụ conducive na nkwalite nke corrosion iguzogide nke ihe na-eguzogide oxidation nke elu okpomọkụ.

5. Ion beam na-enyere aka ntinye nwere ike ịgbanwe ihe ndị electromagnetic nke ihe nkiri ahụ ma melite arụmọrụ nke ihe nkiri dị mkpa.

6. Ion-enyere ntinye aka na-enye ohere ziri ezi na nnwere onwe mgbanwe nke paramita metụtara atomic deposition na ion implantation, na-enye ohere nke sochiri ọgbọ nke coatings nke a ole na ole micrometers na-agbanwe agbanwe mejupụtara na obere bombu ike ike, nke mere na dị iche iche mkpa film nwere ike toro na ụlọ okpomọkụ, na-ezere ọjọọ mmetụta na ihe ma ọ bụ nkenke akụkụ nke nwere ike mere site na-emeso okpomọkụ ha.

–E wepụtara akụkọ aonye na-emepụta igwe mkpuchi ikukuGuangdong Zhenhua