1. Ion beam assisted deposition technology yog tus cwj pwm los ntawm kev muaj zog adhesion ntawm daim nyias nyias thiab cov substrate, cov txheej membrane muaj zog heev. Cov kev sim qhia tau hais tias: ion beam-pab deposition ntawm adhesion tshaj qhov adhesion ntawm thermal vapor deposition nce ntau zaus mus rau ntau pua lub sij hawm, yog vim li cas yog vim li cas yog vim li cas rau lub ion bombardment nyob rau saum npoo ntawm cov nyhuv ntxuav, thiaj li hais tias lub membrane puag interface los tsim ib tug gradient interfacial qauv, los yog hybrid kev hloov txheej txheem, raws li zoo raws li kom txo tau cov membrane kev nyuaj siab.
2. Ion beam assisted deposition tuaj yeem txhim kho cov khoom siv ntawm cov yeeb yaj kiab, ua kom lub neej qaug zog, zoo heev rau kev npaj cov oxides, carbides, cubic BN, TiB2, thiab pob zeb diamond zoo li txheej. Piv txwv li, nyob rau hauv 1Cr18Ni9Ti tshav kub-resistant steel ntawm kev siv ion-beam-pab deposition technology kom loj hlob 200nm Si3N4 zaj duab xis, tsis tsuas yog yuav inhibit qhov tshwm sim ntawm qaug zog tawg ntawm cov khoom, tab sis kuj txo tus nqi ntawm qaug zog tawg diffusion, mus cuag nws lub neej muaj lub luag hauj lwm zoo.
3. Ion beam assisted deposition tuaj yeem hloov qhov kev ntxhov siab ntawm zaj duab xis thiab nws cov qauv crystalline hloov. Piv txwv li, kev npaj ntawm Cr zaj duab xis nrog 11.5keV Xe + los yog Ar + bombardment ntawm lub substrate nto, pom tau hais tias qhov kev hloov ntawm lub substrate kub, bombardment ion zog, ions thiab atoms mus txog rau qhov ratio ntawm tsis, yuav ua rau cov kev ntxhov siab los ntawm tensile kev nyuaj siab mus rau compressive kev nyuaj siab, crystalline qauv ntawm cov zaj duab xis kuj yuav tsim kev hloov. Nyob rau hauv ib qho piv txwv ion-rau-atom tuaj txog, ion beam pab deposition muaj kev xaiv zoo dua li cov txheej membrane tso los ntawm thermal vapor deposition.
4.Ion beam pab deposition tuaj yeem txhim kho corrosion kuj thiab oxidation tsis kam ntawm daim nyias nyias. Vim qhov ceev ntawm ion beam-pab deposition ntawm cov zaj duab xis txheej, zaj duab xis puag interface qauv txhim kho los yog tsim ntawm amorphous lub xeev tshwm sim los ntawm qhov ploj ntawm grain ciam teb ntawm cov hais, uas yog conducive rau txhim kho corrosion kuj ntawm cov khoom thiab tiv thaiv oxidation ntawm kub kub.
5. Ion beam assisted deposition tuaj yeem hloov cov khoom siv hluav taws xob ntawm cov yeeb yaj kiab thiab txhim kho kev ua haujlwm ntawm cov yeeb yaj kiab nyias.
6. Ion-pab deposition tso cai meej thiab ywj siab hloov ntawm cov tsis muaj feem xyuam rau atomic deposition thiab ion implantation, thiab tso cai rau lub successive tiam ntawm coatings ntawm ob peb micrometers nrog ib tug muaj pes tsawg leeg ntawm tsawg bombardment energies, thiaj li hais tias ntau yam nyias films yuav loj hlob nyob rau hauv chav tsev kub, tsis txhob muaj kev phiv los ntawm cov ntaub ntawv los yog precision qhov chaw uas yuav tshwm sim los ntawm qhov kub thiab txias.
– Zaj lus no yog tso tawm los ntawmtshuab nqus tsev txheej tshuab manufacturersGuangdong Zhenhua
Post lub sij hawm: Jan-24-2024