I-Sputtering isenzakalo lapho izinhlayiya ezinamandla (imvamisa ama-ion ama-positive) zishayisa indawo eqinile (ngezansi ebizwa ngokuthi into eqondiwe), okwenza ama-athomu (noma ama-molecule) angaphezulu kwalokho okuqondiwe ukuba aphume kukho.
Lesi senzakalo satholwa ngu-Grove ngo-1842 lapho impahla ye-cathode ithuthelwa odongeni lweshubhu ye-vacuum ngesikhathi sokuhlolwa kokuhlola ukugqwala kwe-cathodic. Le ndlela ye-sputtering ekufakweni kwe-substrate yamafilimu amancane yatholakala ngo-1877, ngenxa yokusebenzisa le ndlela ukufakwa kwamafilimu amancane ezigabeni zokuqala zezinga lokufafaza liphansi, ijubane lefilimu eliphansi, kufanele limiswe kudivayisi ye-high-pressure futhi lidlulele igesi elithintekayo kanye nolunye uchungechunge lwezinkinga, ngakho ukuthuthukiswa kuhamba kancane kakhulu futhi kucishe kuqedwe amakhemikhali ensimbi, amakhemikhali asebenzayo kuphela, asebenzayo kuphela. ama-dielectrics, kanye nama-chemical compounds, izinto ezitholakala kwinani elincane lezinhlelo zokusebenza. Kuze kube yiminyaka yama-1970, ngenxa yokuvela kobuchwepheshe be-magnetron sputtering, i-sputtering coating iye yathuthukiswa ngokushesha, yaqala ukungena ekuvuselelweni komgwaqo. Lokhu kungenxa yokuthi indlela ye-magnetron sputtering ingavinjelwa insimu ye-orthogonal electromagnetic kuma-electron, okwandisa amathuba okushayisana kwama-electron nama-molecule egesi, akugcini nje ukunciphisa i-voltage engezwe ku-cathode, futhi kuthuthukise izinga lokufafaza kwama-ion amahle ku-cathode ehlosiwe, ukunciphisa amathuba okushayisana kwama-electron lapho kuncishiswa ibhomu, ibhomu lapho izinga lokushisa liyancipha. “isivinini esikhulu, izinga lokushisa eliphansi Izici ezimbili eziyinhloko “zejubane eliphezulu nezinga lokushisa eliphansi”.
Kuze kube yiminyaka yawo-1980, nakuba yabonakala iminyaka eyishumi nambili kuphela, igqamile elabhorethri, ngempela emkhakheni wokukhiqiza ngobuningi bezimboni. Ngokuthuthuka okuqhubekayo kwesayensi nobuchwepheshe, eminyakeni yamuva emkhakheni wokugcoba ama-sputtering kanye nokwethulwa kwe-ion beam ye-sputtering ethuthukisiwe, ukusetshenziswa komthombo obanzi womthombo we-ion wamanje oqinile ohlangene nokuguquguquka kwamandla kazibuthe, kanye nenhlanganisela ye-dipole sputtering evamile eyakhiwe imodi entsha ye-sputtering; futhi kuzoba ukwethulwa kwamandla amanje ashintshashintshayo we-intermediate-frequency kumthombo ohlosiwe we-magnetron sputtering. Lobu buchwepheshe be-medium-frequency AC magnetron sputtering, obubizwa ngokuthi i-twin target sputtering, akugcini nje ngokuqeda umphumela "wokunyamalala" we-anode, kodwa futhi kuxazulula inkinga "yobuthi" ye-cathode, ethuthukisa kakhulu ukuzinza kwe-magnetron sputtering, futhi inikeza isisekelo esiqinile sokukhiqizwa kwezimboni zamafilimu amancane amancane. Lokhu kuye kwathuthukisa kakhulu ukuzinza kwe-magnetron sputtering futhi kwanikeza isisekelo esiqinile sokukhiqizwa kwezimboni zamafilimu amancane amancane. Eminyakeni yamuva, i-sputtering coating isibe ubuchwepheshe bokulungiselela ifilimu abasafufusa obushisayo, obusebenzayo emkhakheni wobuchwepheshe be-vacuum coating.
-Le ndatshana ikhishwe nguumenzi womshini we-vacuum coatingI-Guangdong Zhenhua
Isikhathi sokuthumela: Dec-05-2023