Hoʻōla hou ʻana a me ka hoʻomohala ʻana i ka uhi ʻana o ka Vacuum Sputtering

ʻO ka sputtering kahi hanana kahi e paʻi ai nā ʻāpana ikehu (ʻo ka maʻamau he mau ion maikaʻi o nā kinoea) i ka ʻili o kahi mea paʻa (i kapa ʻia ma lalo ʻo ka mea i manaʻo ʻia), e hoʻoulu ana i nā ʻātoma (a i ʻole nā ​​​​molekula) ma luna o ka ʻili o ka mea i manaʻo ʻia e pakele mai ia mea.

Ua ʻike ʻia kēia hanana e Grove i ka makahiki 1842 i ka wā i neʻe ʻia ai ka mea cathode i ka paia o kahi paipu vacuum i ka wā o kahi hoʻokolohua e aʻo ai i ka cathodic corrosion. Ua ʻike ʻia kēia ʻano sputtering i ka waiho ʻana o nā kiʻiʻoniʻoni lahilahi i ka makahiki 1877, ma muli o ka hoʻohana ʻana i kēia ʻano hana waiho ʻana o nā kiʻiʻoniʻoni lahilahi i nā pae mua o ka sputtering rate haʻahaʻa, lohi ka wikiwiki o ka kiʻiʻoniʻoni, pono e hoʻonohonoho ʻia i loko o ka hāmeʻa o ke kaomi kiʻekiʻe a hele i loko o ke kinoea affective a me nā pilikia ʻē aʻe, no laila lohi loa ka hoʻomohala ʻana a kokoke e hoʻopau ʻia, aia wale nō i loko o nā metala makamae reactive chemical, nā metala refractory, dielectrics, a me nā hui kemika, nā mea ma kahi helu liʻiliʻi o nā noi. A hiki i ka makahiki 1970, ma muli o ka puka ʻana mai o ka ʻenehana magnetron sputtering, ua hoʻomohala koke ʻia ka uhi sputtering, hoʻomaka e komo i ke ola hou ʻana o ke alanui. ʻO kēia no ka mea hiki ke kaupalena ʻia ke ʻano hana magnetron sputtering e ke kahua electromagnetic orthogonal ma nā electrons, e hoʻonui ana i ka hiki ke kuʻi ʻana o nā electrons a me nā molekala kinoea, ʻaʻole wale e hōʻemi i ka volta i hoʻohui ʻia i ka cathode, a hoʻomaikaʻi i ka helu sputtering o nā ions maikaʻi ma ka cathode target, e hōʻemi ana i ka hiki ke hoʻopōʻino ʻia nā electrons ma ka substrate, a laila e hōʻemi ana i kona mahana, me ka "wikiwiki kiʻekiʻe, haʻahaʻa ka mahana ʻO nā ʻano nui ʻelua o "wikiwiki kiʻekiʻe a me ka mahana haʻahaʻa".

I nā makahiki 1980, ʻoiai ua ʻike ʻia he ʻumikūmālua wale nō makahiki, kū i waho ia mai ka hale hana, i loko o ke kahua o ka hana nui ʻoihana. Me ka hoʻomohala hou ʻana o ka ʻepekema a me ka ʻenehana, i nā makahiki i hala iho nei ma ke kahua o ka uhi sputtering a me ka hoʻolauna ʻana o ka ion beam i hoʻonui ʻia ka sputtering, ka hoʻohana ʻana i kahi kukuna ākea o ke kumu ion ikaika i hui pū ʻia me ka modulation kahua magnetic, a me ka hui pū ʻana o ka dipole sputtering maʻamau i haku ʻia me kahi ʻano sputtering hou; a e lilo ia i ka hoʻolauna ʻana o ka mana uila waena-frequency i ke kumu pahuhopu magnetron sputtering. ʻO kēia ʻenehana sputtering AC magnetron medium-frequency, i kapa ʻia ʻo twin target sputtering, ʻaʻole wale e hoʻopau i ka hopena "nalowale" o ka anode, akā e hoʻoponopono pū i ka pilikia "ʻawaʻawa" o ka cathode, kahi e hoʻomaikaʻi nui ai i ke kūpaʻa o ka magnetron sputtering, a hāʻawi i kahi kahua paʻa no ka hana ʻoihana o nā kiʻiʻoniʻoni lahilahi hui. Ua hoʻomaikaʻi nui kēia i ke kūpaʻa o ka magnetron sputtering a hāʻawi i kahi kahua paʻa no ka hana ʻoihana o nā kiʻiʻoniʻoni lahilahi hui. I nā makahiki i hala iho nei, ua lilo ka uhi ʻana i ka sputtering i mea hoʻomākaukau kiʻiʻoniʻoni e kū mai ana i kahi ʻenehana hoʻomākaukau kiʻiʻoniʻoni, e hana nei i ke kahua o ka ʻenehana uhi vacuum.

–Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini uhi hakahakaGuangdong Zhenhua