Kusputtering chiitiko apo zvidimbu zvine simba (kazhinji maion akanaka emagasi) zvinorova pamusoro pechinhu chakasimba (chinonzi pasi apa chinhu chinotarirwa), zvichiita kuti maatomu (kana mamorekuru) ari pamusoro pechinhu chinotarirwa abude machiri.
Chiitiko ichi chakawanikwa naGrove muna 1842 apo zvinhu zve cathode zvakatamiswa kuenda kumadziro echubhu ye vacuum panguva yekuedza kudzidza cathodic corrosion. Iyi nzira yekuputira mu substrate deposition yemafirimu matete yakawanikwa muna 1877, nekuda kwekushandisa nzira iyi, kuiswa kwemafirimu matete mumatanho ekutanga e sputtering rate kwakaderera, kunonoka firimu kumhanya, kunofanira kuiswa mumudziyo we high-pressure uye kupfuudzwa mu affective gas nezvimwe zvakatevedzana zvematambudziko, saka kukura kwacho kunononoka zvikuru uye kuda kubviswa, chete mumakemikari anokosha anoshandiswa, refractory metals, dielectrics, uye makemikari compounds, zvinhu zviri panhamba shoma yekushandiswa. Kusvika kuma1970, nekuda kwekubuda kwetekinoroji yekuputira magnetron, sputtering coating yakakurumidza kugadzirwa, yakatanga kupinda mukudzorerwa kwemugwagwa. Izvi zvinodaro nekuti nzira ye magnetron sputtering inogona kudziviswa ne orthogonal electromagnetic field pama electron, zvichiwedzera mukana wekusangana kwema electron nema gas molecules, kwete kungoderedza voltage inowedzerwa ku cathode chete, uye kuvandudza mwero wekusputter kwema positive ions pa target cathode, zvichideredza mukana wekubhomba kwema electron pa substrate, nokudaro zvichideredza tembiricha yayo, ne "high speed, low temperature The two main hunhu hwe "high speed uye low temperature".
Kuma1980, kunyangwe yakaonekwa kwemakore gumi nemaviri chete, yakabuda pachena kubva murabhoritari, ichipinda muindasitiri yekugadzira zvinhu zvakawanda. Nekufambira mberi kwesainzi netekinoroji, mumakore achangopfuura mumunda we sputtering coating uye kuunzwa kweion beam yakawedzerwa sputtering, kushandiswa kwe wide beam ye strong current ion source pamwe chete ne magnetic field modulation, uye nekubatanidzwa kwe conventional dipole sputtering inoumbwa nenzira itsva ye sputtering; uye ichave kuunzwa kwe intermediate-frequency alternating current power supply kune magnetron sputtering target source. Iyi medium-frequency AC magnetron sputtering tekinoroji, inonzi twin target sputtering, haingobvisi chete "disappearance" effect ye anode, asiwo inogadzirisa dambudziko re "poisoning" ye cathode, izvo zvinovandudza zvikuru kugadzikana kwe magnetron sputtering, uye zvinopa hwaro hwakasimba hwekugadzirwa kwe compound thin films. Izvi zvakavandudza zvikuru kugadzikana kwe magnetron sputtering uye zvakapa hwaro hwakasimba hwekugadzirwa kwe compound thin films. Mumakore achangopfuura, kuputira purasitiki kwave tekinoroji itsva yekugadzirira firimu, inoshanda mumunda we tekinoroji yekuputira purasitiki.
–Chinyorwa ichi chakaburitswa namugadziri wemuchina wevacuum coatingGuangdong Zhenhua
Nguva yekutumira: Zvita-05-2023