Sputtering yog ib qho xwm txheej uas cov khoom me me (feem ntau yog cov ions zoo ntawm cov roj) ntaus rau ntawm qhov chaw ntawm cov khoom khov (hauv qab no hu ua cov khoom siv), ua rau cov atoms (lossis molecules) ntawm qhov chaw ntawm cov khoom siv kom dim ntawm nws.
Xyoo 1842, Grove tau tshawb pom qhov xwm txheej no thaum cov khoom siv cathode tau tsiv mus rau phab ntsa ntawm lub raj nqus tsev thaum lub sijhawm sim los kawm txog kev xeb cathodic. Txoj kev sputtering no hauv kev tso cov zaj duab xis nyias nyias tau tshawb pom xyoo 1877, vim tias siv txoj kev no, kev tso cov zaj duab xis nyias nyias thaum ntxov ntawm qhov nrawm sputtering qis, qeeb qeeb, yuav tsum tau teeb tsa hauv lub cuab yeej ntawm kev kub siab thiab dhau mus rau hauv cov roj affective thiab lwm yam teeb meem, yog li kev txhim kho qeeb heev thiab yuav luag tshem tawm, tsuas yog nyob rau hauv cov hlau muaj nqis reactive, cov hlau refractory, dielectrics, thiab cov tshuaj sib xyaw, cov ntaub ntawv ntawm cov ntawv thov me me. Txog rau xyoo 1970, vim muaj kev tshwm sim ntawm magnetron sputtering technology, sputtering txheej tau tsim sai, pib nkag mus rau hauv kev rov qab los ntawm txoj kev. Qhov no yog vim tias txoj kev magnetron sputtering tuaj yeem raug txwv los ntawm orthogonal electromagnetic teb ntawm cov electrons, ua rau muaj feem cuam tshuam ntawm kev sib tsoo ntawm cov electrons thiab cov roj molecules, tsis yog tsuas yog txo qhov voltage ntxiv rau cathode, thiab txhim kho qhov sputtering tus nqi ntawm cov ions zoo ntawm lub hom phiaj cathode, txo qhov feem cuam tshuam ntawm kev foob pob ntawm cov electrons ntawm lub substrate, yog li txo nws qhov kub, nrog "kev kub ceev, kub qis Ob qho tseem ceeb ntawm "kev kub ceev thiab kub qis".
Txog rau xyoo 1980, txawm hais tias nws tsuas yog tshwm sim kaum ob xyoos xwb, nws sawv tawm ntawm lub chaw kuaj mob, tiag tiag rau hauv thaj chaw ntawm kev tsim khoom loj. Nrog rau kev txhim kho ntxiv ntawm kev tshawb fawb thiab thev naus laus zis, nyob rau xyoo tas los no hauv thaj chaw ntawm sputtering txheej thiab kev qhia txog ion beam enhanced sputtering, kev siv lub teeb dav dav ntawm lub zog tam sim no ion qhov chaw ua ke nrog magnetic field modulation, thiab nrog rau kev sib xyaw ua ke ntawm cov dipole sputtering ib txwm muaj ib hom sputtering tshiab; thiab yuav yog kev qhia txog nruab nrab zaus alternating tam sim no fais fab mov rau lub hom phiaj magnetron sputtering. Qhov nruab nrab zaus AC magnetron sputtering technology, hu ua twin target sputtering, tsis yog tsuas yog tshem tawm qhov "ploj mus" ntawm anode, tab sis kuj daws qhov teeb meem "lom" ntawm cathode, uas ua rau zoo heev rau kev ruaj ntseg ntawm magnetron sputtering, thiab muab lub hauv paus ruaj khov rau kev tsim khoom lag luam ntawm cov yeeb yaj kiab nyias nyias. Qhov no tau txhim kho qhov ruaj khov ntawm magnetron sputtering thiab muab lub hauv paus ruaj khov rau kev tsim khoom lag luam ntawm cov yeeb yaj kiab nyias nyias. Nyob rau hauv xyoo tas los no, sputtering txheej txheem tau dhau los ua ib qho kev siv tshuab ua yeeb yaj kiab kub tshiab, ua haujlwm hauv thaj chaw ntawm cov txheej txheem nqus tsev.
– Tsab xov xwm no yog tso tawm los ntawmlub tshuab nqus tsev txheej tshuab chaw tsim khoomGuangdong Zhenhua
Lub sijhawm tshaj tawm: Lub Kaum Ob Hlis-05-2023