ion beam sputtering coat le ion beam etching

1. Ion beam sputtering barbotage

Bokaholimo ba thepa bo hlasetsoe ka seretse sa ion sa matla a mahareng, 'me matla a li-ion ha a kene ka lesela la kristale la lintho tse bonahalang, empa a fetisetsa matla ho liathomo tse shebiloeng, a etsa hore li tlosoe ka holim'a thepa, ebe li theha filimi e tšesaane ka deposition holim'a workpiece. Ka lebaka la sputtering e hlahisoang ke beam ea ion, matla a liathomo tsa lera la filimi e hloekisitsoeng a phahame haholo, 'me thepa e reretsoeng e phunyeletsoa ka ion beam sebakeng se phahameng, ho hloeka ha lesela la filimi ho phahame,' me lifilimi tsa boleng bo phahameng li ka behoa, ha botsitso ba filimi ea ion bo ntse bo ntlafatsoa, ​​​​e ka finyellang morero oa filimi le ho ntlafatsa. Sepheo sa ion beam sputtering ke ho theha lisebelisoa tse ncha tse tšesaane tsa filimi.

2. Ion beam etching

Ion beam etching e boetse e le bomo ea matla a mahareng a matla a holim'a thepa ho hlahisa sputtering, etching effect on the substrate, ke sesebelisoa sa semiconductor, lisebelisoa tsa optoelectronic le libaka tse ling tsa tlhahiso ea theknoloji ea mantlha ea litšoantšo. Theknoloji ea ho lokisetsa li-chips ka li-circuits tse kopantsoeng tsa semiconductor e kenyelletsa ho lokisoa ha limilione tsa li-transistors holim'a sephaephe sa silicon se le seng se nang le bophara ba Φ12in (Φ304.8mm). Transistor e 'ngoe le e' ngoe e hahiloe ka mekhahlelo e mengata ea lifilimi tse tšesaane tse nang le mesebetsi e fapaneng, e nang le lesela le sebetsang, lesela le sireletsang, lesela la ho itšehla thajana, le lesela la conductive. Karolo e 'ngoe le e' ngoe e sebetsang e na le mohlala oa eona, kahoo ka mor'a hore filimi e 'ngoe le e' ngoe e sebetse e pentiloe, likarolo tse se nang thuso li hloka ho kenngoa ka lebaleng la ion, li siea likarolo tse molemo tsa filimi li ntse li le teng. Matsatsing ana, bophara ba terata ba chip bo fihlile ho 7mm, 'me etching ea beam ea ion ea hlokahala ho lokisa mohlala o motle joalo. Ion beam etching ke mokhoa o omileng oa etching o nang le ho nepahala ho holimo ha ho bapisoa le mokhoa oa ho koloba o sebelisitsoeng qalong.

Theknoloji ea ion beam etching e nang le etching ea beam ea ion e sa sebetseng le etching ea beam e sebetsang ka mefuta e 'meli. Ea pele e nang le beam etching ea argon ion, ke ea karabelo ea 'mele; ea morao-rao e nang le fluorine ion beam sputtering, fluorine ion beam ho phaella ho matla a phahameng a ho hlahisa karolo ea tramp, fluorine ion beam e ka boela ea kenngoa le SiO.₂, Si₃N4, GaAs, W le lifilimi tse ling tse tšesaane li na le karabelo ea lik'hemik'hale, ke ts'ebetso ea karabelo ea 'mele, empa hape le ts'ebetso ea karabelo ea lik'hemik'hale ea thekenoloji ea ion beam etching, sekhahla sa etching se potlakile. Likhase tse senyang tse bakang phetohelo ke CF₄, C₂F₆Tlhaloso: CCl4,BCl₃, joalo-joalo, li-reactants tse hlahisitsoeng bakeng sa SiF₄, SiCl₄, GCl₃le WF₆ ho ntšoa likhase tse senyang. Theknoloji ea Ion beam etching ke theknoloji ea bohlokoa ea ho hlahisa lihlahisoa tsa theknoloji e phahameng.

-Sengoliloeng sena se lokolloa kemoetsi oa mochine oa vacuum coatingGuangdong Zhenhua