Kuphimba kwa ion beam sputtering ndi ion beam etching

1. Chophimba cha ion beam sputtering

Pamwamba pa chinthucho pamakhala ion beam yapakati-mphamvu, ndipo mphamvu ya ma ion siimalowa mu crystal lattice ya chinthucho, koma imasamutsa mphamvuyo ku ma atomu omwe akufuna, zomwe zimapangitsa kuti atuluke kuchokera pamwamba pa chinthucho, kenako nkupanga filimu yopyapyala poika pa workpiece. Chifukwa cha sputtering yomwe imapangidwa ndi ion beam, mphamvu ya ma atomu a filimu yomwe yatuluka ndi yayikulu kwambiri, ndipo chinthucho chimaphikidwa ndi ion beam mu vacuum yambiri, kuyera kwa filimuyo ndi kwakukulu, ndipo mafilimu apamwamba amatha kusungidwa, pomwe kukhazikika kwa filimu ya ion beam kumawonjezeka, zomwe zitha kukwaniritsa cholinga chowongolera mawonekedwe ndi makina a filimuyo. Cholinga cha sputtering ya ion beam ndikupanga zipangizo zatsopano zopyapyala za filimuyo.

2. Kudula kwa ion beam

Kuboola kwa ion beam ndi njira yolumikizira ma ion beam yapakati pamwamba pa chinthucho kuti ipange ma sputtering, effect effect pa substrate, ndi chipangizo cha semiconductor, zida zamagetsi ndi madera ena opangira ukadaulo wazithunzi. Ukadaulo wokonzekera ma chips mu ma semiconductor integrated circuits umaphatikizapo kukonzekera ma transistors mamiliyoni ambiri pa single-crystal silicon wafer yokhala ndi mainchesi a Φ12in (Φ304.8mm). Transistor iliyonse imapangidwa kuchokera ku zigawo zingapo za mafilimu owonda okhala ndi ntchito zosiyanasiyana, zomwe zimakhala ndi gawo logwira ntchito, gawo loteteza, gawo lodzipatula, ndi gawo loyendetsa. Gawo lililonse logwira ntchito lili ndi kapangidwe kake, kotero gawo lililonse la filimu yogwira ntchito likapakidwa, zigawo zopanda ntchito ziyenera kuchotsedwa ndi ion beam, ndikusiya zigawo zothandiza za filimuyo zili bwino. Masiku ano, m'lifupi mwa waya wa chip wafika 7mm, ndipo ion beam etching ndi yofunikira kuti pakhale chitsanzo chabwino chotere. Kuboola kwa ion beam ndi njira youma yoboola yokhala ndi kulondola kwakukulu poyerekeza ndi njira yonyowa yoboola yomwe idagwiritsidwa ntchito pachiyambi.

Ukadaulo wopaka beam ya Ion wokhala ndi ma etching osagwira ntchito a ion ndi ma etching a ion ogwira ntchito okhala ndi mitundu iwiri. Woyamba wokhala ndi ma etching a argon ion, ndi wa thupi; womaliza wokhala ndi ma fluorine ion beam sputtering, fluorine ion beam komanso mphamvu zambiri zopanga ntchito ya tramp, fluorine ion beam ikhozanso kujambulidwa ndi SiO2.₂、Si₃Mafilimu a N4, GaAs, W ndi ena opyapyala ali ndi njira yochitira zinthu, ndi njira yochitira zinthu zakuthupi, komanso njira yochitira zinthu pogwiritsa ntchito ukadaulo wothira ma ion beam, ndipo mphamvu yothira imathamanga kwambiri. Mpweya wothira ma reaction ndi CF.₄、C₂F₆、CCl4、BCl₃, ndi zina zotero, ma reactants opangidwa a SiF₄、SiCl₄、GCl₃ndi WF₆ mpweya wowononga umachotsedwa. Ukadaulo wopaka chitsulo cha ion ndiye ukadaulo wofunikira kwambiri popanga zinthu zamakono.

– Nkhaniyi yatulutsidwa ndiwopanga makina ophikira vacuumGuangdong Zhenhua