Rufin ion na ion da kuma ion na ion na ion na ion

1. Rufin ion na sputtering

Ana jefa saman kayan da hasken ion mai matsakaicin kuzari, kuma kuzarin ions ɗin ba sa shiga layin kristal na kayan, amma suna tura kuzarin zuwa ga ƙwayoyin da aka nufa, wanda hakan ke sa su yi ta toka daga saman kayan, sannan su samar da siririn fim ta hanyar ajiyewa a kan kayan aiki. Saboda fitar da hasken da hasken ion ke samarwa, kuzarin ƙwayoyin halittar da aka nufa suna da yawa sosai, kuma ana jefar da hasken ion ɗin da hasken a cikin wani wuri mai tsabta, tsarkin layin fim ɗin yana da yawa, kuma ana iya ajiye fina-finai masu inganci, yayin da ake inganta kwanciyar hankali na layin fim ɗin hasken ion, wanda zai iya cimma manufar inganta halayen gani da na inji na layin fim ɗin. Manufar fitar da hasken ion shine ƙirƙirar sabbin kayan fim masu siriri.

2. Ƙirƙirar hasken ion

Etching na ion beam shi ma wani abu ne mai matsakaicin kuzari na ion beam na saman kayan don samar da tasirin sputtering, etching etching akan substrate, na'urar semiconductor ce, na'urorin optoelectronic da sauran fannoni na samar da fasahar zane-zane. Fasahar shiri don kwakwalwan kwamfuta a cikin da'irori masu haɗa semiconductor ta ƙunshi shirya miliyoyin transistor akan wafer silicon guda ɗaya mai diamita na Φ12in (Φ304.8mm). An gina kowane transistor daga yadudduka da yawa na siraran fina-finai masu ayyuka daban-daban, waɗanda suka ƙunshi Layer mai aiki, Layer mai rufi, Layer keɓewa, da Layer mai sarrafawa. Kowane Layer mai aiki yana da nasa tsarin, don haka bayan an rufe kowane Layer na fim mai aiki, ana buƙatar a goge sassan marasa amfani da katakon ion, wanda ke barin sassan fim masu amfani ba tare da matsala ba. A zamanin yau, faɗin waya na guntu ya kai 7mm, kuma etching na katakon ion ya zama dole don shirya irin wannan kyakkyawan tsari. Etching na katakon ion hanya ce ta etching bushe tare da babban daidaiton etching idan aka kwatanta da hanyar etching da aka yi amfani da ita a farkon.

Fasahar etching beam na ion tare da etching beam na ion mara aiki da etching beam na ion mai aiki tare da nau'i biyu. Na farko tare da etching beam na argon, yana cikin amsawar jiki; na biyu tare da sputtering beam na fluorine, beam na fluorine ban da babban kuzari don samar da rawar da tramp, ana iya etching beam na fluorine tare da SiO2₂、Si₃N4、GaAs、W da sauran siririn fim suna da amsawar sinadarai, duka tsarin amsawar jiki ne, amma kuma tsarin amsawar sinadarai na fasahar etching ion beam, saurin etching yana da sauri. Iskar gas mai lalata suna da CF.₄、C₂F₆、CCl4、BCl₃da sauransu, abubuwan da aka samar don SiF₄、SiCl₄、GCl₃;, da kuma WF₆ Ana fitar da iskar gas mai lalata. Fasahar etching na ion beam ita ce babbar fasahar samar da kayayyaki masu fasaha.

– An fitar da wannan labarin ne dagainjin shafa injin injinGuangdong Zhenhua