1. Ka uhi ʻana o ke kukuna ion
Hoʻopōʻino ʻia ka ʻili o ka mea me kahi kukuna ion ikehu waena, a ʻaʻole komo ka ikehu o nā ion i loko o ka lattice kristal o ka mea, akā hoʻoili i ka ikehu i nā ʻātoma i manaʻo ʻia, e hoʻoulu ana iā lākou e sputter mai ka ʻili o ka mea, a laila hana i kahi kiʻiʻoniʻoni lahilahi ma ka waiho ʻana ma luna o ka workpiece. Ma muli o ka sputtering i hana ʻia e ke kukuna ion, kiʻekiʻe loa ka ikehu o nā ʻātoma papa kiʻiʻoniʻoni sputtered, a hoʻopōʻino ʻia ka mea i manaʻo ʻia me ke kukuna ion i loko o kahi vacuum kiʻekiʻe, kiʻekiʻe ka maʻemaʻe o ka papa kiʻiʻoniʻoni, a hiki ke waiho ʻia nā kiʻiʻoniʻoni kiʻekiʻe, ʻoiai e hoʻomaikaʻi ʻia ke kūpaʻa o ka papa kiʻiʻoniʻoni kukuna ion, hiki ke hoʻokō i ke kumu o ka hoʻomaikaʻi ʻana i nā waiwai optical a me mechanical o ka papa kiʻiʻoniʻoni. ʻO ke kumu o ka sputtering kukuna ion ʻo ia ke hana i nā mea kiʻiʻoniʻoni lahilahi hou.
2. Ke kālai ʻana i ke kukuna ion
ʻO ke kālai ʻana i ka beam ion he hoʻopōkā ʻana i ka beam ion medium-energy o ka ʻili o ka mea e hana ai i ka sputtering, ka hopena etching ma ka substrate, he mea semiconductor, nā mea optoelectronic a me nā wahi ʻē aʻe o ka hana ʻana o ka ʻenehana kumu kiʻi. ʻO ka ʻenehana hoʻomākaukau no nā chips i nā semiconductor integrated circuits e pili ana i ka hoʻomākaukau ʻana o nā miliona o nā transistors ma kahi wafer silicon kristal hoʻokahi me ke anawaena o Φ12in (Φ304.8mm). Kūkulu ʻia kēlā me kēia transistor mai nā papa he nui o nā kiʻiʻoniʻoni lahilahi me nā hana like ʻole, nona kahi papa hana, kahi papa insulating, kahi papa hoʻokaʻawale, a me kahi papa conductive. Loaʻa i kēlā me kēia papa hana kona ʻano ponoʻī, no laila ma hope o ka uhi ʻia ʻana o kēlā me kēia papa o ka kiʻiʻoniʻoni hana, pono e kālai ʻia nā ʻāpana pono ʻole me kahi beam ion, e waiho ana i nā ʻāpana kiʻiʻoniʻoni pono. I kēia mau lā, ua hiki ka laulā o ka chip i 7mm, a pono ka ion beam etching e hoʻomākaukau i kēlā ʻano maikaʻi. ʻO ke kālai ʻana i ka beam ion kahi ʻano kālai maloʻo me ka pololei o ke kālai ʻana i hoʻohālikelike ʻia me ke ʻano kālai pulu i hoʻohana ʻia i ka hoʻomaka.
ʻO ka ʻenehana ʻoki ʻana i ke kukuna ion me ka ʻoki ʻana i ke kukuna ion hana ʻole a me ke ʻano ʻoki ʻana i ke kukuna ion hana ʻelua. ʻO ka mea mua me ke kukuna ion argon, no ke ʻano kino; ʻo ka mea hope me ka sputtering kukuna ion fluorine, me ka ikehu kiʻekiʻe e hana i ke kuleana o ka tramp, hiki ke ʻoki ʻia ke kukuna ion fluorine me SiO2ʻO Si3Loaʻa i nā kiʻiʻoniʻoni lahilahi ʻē aʻe kahi hopena kemika, ʻo ia ke kaʻina hana kino, a ʻo ke kaʻina hana kemika hoʻi o ka ʻenehana ʻoki ʻana ion beam, wikiwiki ka wikiwiki o ka ʻoki ʻana. ʻO nā kinoea corrosive o ka ʻoki ʻana he CF4ʻO C2F6CCl4, BCl3, a pēlā aku, nā mea hana i hana ʻia no SiF4ʻO SiCl4、GCl3;, a me WF6 Ua unuhi ʻia nā kinoea ʻino. ʻO ka ʻenehana ʻeli kukuna Ion ke ʻenehana koʻikoʻi e hana i nā huahana ʻenehana kiʻekiʻe.
–Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini uhi hakahakaGuangdong Zhenhua
Ka manawa hoʻouna: ʻOkakopa-24-2023

