Mkpuchi ion na ihe mkpuchi ion na-agbaze

1. mkpuchi ion osisi sputtering

A na-eji ọkụ ion dị ike nke na-adị n'etiti ihe ahụ ekpuchi elu ihe ahụ, ike nke ion anaghị abanye na lattice kristal nke ihe ahụ, kama ọ na-ebufe ike ahụ gaa na atọm ndị a na-elekwasị anya, na-eme ka ha gbapụ n'elu ihe ahụ, wee mepụta ihe nkiri dị gịrịgịrị site na itinye ya na ihe eji arụ ọrụ. N'ihi mmụba nke ọkụ ion na-emepụta, ike nke atọm oyi akwa ihe nkiri a na-agbapụta dị elu nke ukwuu, a na-agbakwa ihe a na-elekwasị anya na ọkụ ion n'ime oghere dị elu, ịdị ọcha nke oyi akwa ihe nkiri ahụ dị elu, a pụkwara itinye ihe nkiri dị elu, ebe a na-eme ka nkwụsi ike nke oyi akwa ihe nkiri ion dịkwuo mma, nke nwere ike imezu ebumnuche nke imeziwanye ihe anya na igwe nke oyi akwa ihe nkiri ahụ. Ebumnuche nke ọkụ ion bụ ịmepụta ihe nkiri dị gịrịgịrị ọhụrụ.

2. Ịkụnye ion beam

Ịkụcha ihe n'ime oghere ion bụkwa ihe na-eme ka ion dị n'etiti ike na-agbawa elu ihe ahụ iji mepụta mmetụta mgbawa, mmetụta mgbawa na substrate, bụ ngwaọrụ semiconductor, ngwaọrụ optoelectronic na mpaghara ndị ọzọ nke mmepụta teknụzụ isi eserese. Teknụzụ nkwadebe maka chips na sekit agbakọtara na semiconductor gụnyere nkwadebe ọtụtụ nde transistors na otu kristal silicon wafer nwere dayameta nke Φ12in (Φ304.8mm). A na-eji ọtụtụ oyi akwa nke ihe nkiri dị gịrịgịrị arụ transistor ọ bụla nwere ọrụ dị iche iche, nke gụnyere oyi akwa na-arụ ọrụ, oyi akwa mkpuchi, oyi akwa iche, na oyi akwa na-eduzi. Oyi akwa ọrụ ọ bụla nwere ụkpụrụ nke ya, yabụ mgbe e tinyere oyi akwa nke ihe nkiri arụ ọrụ ọ bụla, a ga-eji oghere ion kpụchaa akụkụ ndị na-abaghị uru, na-ahapụ akụkụ ihe nkiri bara uru ka ha ghara ịdị. Taa, obosara waya nke mgbawa ahụ erutela 7mm, ọ dịkwa mkpa ịkpụcha ihe n'ime oghere ion iji kwadebe ụdị dị mma dị otú ahụ. Ịkụcha ihe n'ime oghere ion bụ usoro ịkụcha ihe kpọrọ nkụ nke nwere izi ezi dị elu ma e jiri ya tụnyere usoro ịkụcha ihe mmiri ejiri na mbido.

Teknụzụ e ji ion ...₂、Si₃N4、GaAs、W na ihe nkiri ndị ọzọ dị gịrịgịrị nwere mmeghachi omume kemịkalụ, ọ bụ ma usoro mmeghachi omume anụ ahụ, kamakwa usoro mmeghachi omume kemịkalụ nke teknụzụ etching ion beam, ọnụego etching dị ngwa ngwa. Gas etching reaction bụ CF₄,C₂F₆、CCl4、BCl₃wdg, ihe ndị na-eme ihe ike maka SiF₄、SiCl₄、GCl₃;、na WF₆ A na-ewepụta gas ndị na-emebi emebi. Teknụzụ etching ion beam bụ teknụzụ dị mkpa iji mepụta ngwaahịa teknụzụ dị elu.

–E bipụtara akụkọ a site n'aka onyeigwe mkpuchi igwe emeputa ihe mkpuchiGuangdong Zhenhua