Ion beam sputtering txheej thiab ion beam etching

1. Ion beam sputtering txheej

Qhov saum npoo ntawm cov khoom siv raug foob pob nrog lub zog nruab nrab ion beam, thiab lub zog ntawm cov ions tsis nkag mus rau hauv lub lattice siv lead ua ntawm cov khoom siv, tab sis hloov lub zog mus rau cov atoms phiaj, ua rau lawv sputtering deb ntawm qhov saum npoo ntawm cov khoom siv, thiab tom qab ntawd tsim ib zaj duab xis nyias los ntawm kev tso rau ntawm qhov workpiece. Vim yog lub sputtering tsim los ntawm lub ion beam, lub zog ntawm cov zaj duab xis txheej sputtered atoms yog siab heev, thiab cov khoom siv phiaj raug foob pob nrog lub ion beam hauv lub tshuab nqus tsev siab, qhov huv ntawm cov zaj duab xis txheej yog siab, thiab cov zaj duab xis zoo tuaj yeem tso, thaum lub zog ntawm cov zaj duab xis txheej ion beam tau txhim kho, uas tuaj yeem ua tiav lub hom phiaj ntawm kev txhim kho cov khoom siv kho qhov muag thiab kho tshuab ntawm cov zaj duab xis txheej. Lub hom phiaj ntawm ion beam sputtering yog los tsim cov ntaub ntawv zaj duab xis nyias tshiab.

2. Ion beam etching

Ion beam etching kuj yog ib qho nruab nrab-zog ion beam bombardment ntawm qhov chaw ntawm cov khoom siv los tsim sputtering, etching nyhuv rau lub substrate, yog ib qho khoom siv semiconductor, optoelectronic khoom siv thiab lwm qhov chaw ntawm kev tsim cov duab core technology. Cov txheej txheem npaj rau cov chips hauv semiconductor integrated circuits cuam tshuam nrog kev npaj ntawm ntau lab tus transistors ntawm ib lub silicon wafer nrog lub cheeb ntawm Φ12in (Φ304.8mm). Txhua lub transistor yog tsim los ntawm ntau txheej ntawm cov yeeb yaj kiab nyias nrog ntau yam haujlwm, muaj ib txheej nquag, ib txheej insulating, ib txheej cais, thiab ib txheej conductive. Txhua txheej ua haujlwm muaj nws tus qauv, yog li tom qab txhua txheej ntawm cov yeeb yaj kiab ua haujlwm tau plated, cov khoom tsis muaj txiaj ntsig yuav tsum tau etched nrog ib lub ion beam, tawm hauv cov khoom siv zaj duab xis tseem ceeb. Niaj hnub no, qhov dav ntawm cov hlau ntawm lub chip tau mus txog 7 hli, thiab ion beam etching yog qhov tsim nyog los npaj cov qauv zoo li no. Ion beam etching yog ib txoj kev etching qhuav nrog qhov tseeb etching siab piv rau txoj kev etching ntub siv thaum pib.

Cov txheej txheem etching siv ion beam etching nrog cov ion beam etching tsis ua haujlwm thiab cov ion beam etching nquag muaj ob hom. Thawj zaug nrog argon ion beam etching, koom nrog cov tshuaj tiv thaiv lub cev; qhov kawg nrog fluorine ion beam sputtering, fluorine ion beam ntxiv rau lub zog siab los tsim lub luag haujlwm ntawm tramp, fluorine ion beam kuj tuaj yeem etched nrog SiO2.₂,Si₃N4, GaAs, W thiab lwm cov yeeb yaj kiab nyias nyias muaj cov tshuaj tiv thaiv, nws yog ob qho tib si cov txheej txheem tshuaj tiv thaiv lub cev, tab sis kuj yog cov txheej txheem tshuaj tiv thaiv ntawm cov txheej txheem ion beam etching, qhov nrawm etching yog ceev. Cov tshuaj tiv thaiv etching corrosive gases yog CF₄,C₂F₆,CCl4,BCl₃, thiab lwm yam, cov reactants tsim rau SiF₄, SiCl₄, GCl₃;,thiab WF₆ yog cov pa roj corrosive raug rho tawm. Ion beam etching technology yog qhov tseem ceeb technology los tsim cov khoom siv high-tech.

– Tsab xov xwm no yog tso tawm los ntawmlub tshuab nqus tsev txheej tshuab chaw tsim khoomGuangdong Zhenhua