Kuputira danda reIon danda uye kuveza danda reIon

1. Kuputira kwedanda reIon

Pamusoro pechinhu chacho pane danda reion rine simba repakati, uye simba reion haripinde mu crystal lattice yezvinhu, asi rinoendesa simba kumaatomu anotarisirwa, zvichiita kuti abude kubva pamusoro pechinhu chacho, uye obva agadzira firimu rakatetepa nekuisa panzvimbo yebasa. Nekuda kwekubuda kwemvura kunokonzerwa nedanda reion, simba remaatomu efirimu rakatyorwa rakakwirira kwazvo, uye chinhu chakanangana nacho chinoputirwa nedanda reion mu vacuum yakakwira, kuchena kwedanda refirimu kwakakwira, uye mafirimu emhando yepamusoro anogona kuiswa, ukuwo kugadzikana kwedanda refirimu reion beam kuchivandudzwa, izvo zvinogona kuzadzisa chinangwa chekuvandudza hunhu hweoptical uye mechanical hwedanda refirimu. Chinangwa chekubudisa kwedanda reion beam ndechekugadzira zvinhu zvitsva zvefirimu zvakatetepa.

2. Kucheka kwedanda reIon

Kucheka kweIon beam zvakare inzira yepakati nepakati yekuisa ion beam pamusoro pechinhu ichi kuti ibudise sputtering, etching effect pa substrate, chishandiso che semiconductor, zvishandiso zve optoelectronic nedzimwe nzvimbo dzekugadzira tekinoroji ye graphics core. Tekinoroji yekugadzirira machipisi mu semiconductor integrated circuits inosanganisira kugadzirira mamiriyoni ema transistors pa single-crystal silicon wafer ine dhayamita ye Φ12in (Φ304.8mm). Transistor yega yega yakagadzirwa kubva muzvikamu zvakasiyana-siyana zvemafirimu matete ane mabasa akasiyana, anosanganisira active layer, insulating layer, isolation layer, uye conductive layer. Operation layer yega yega ine pateni yayo, saka mushure mekunge layer yega yega ye functional film yaiswa, zvikamu zvisina basa zvinofanirwa kuchekwa neion beam, zvichisiya zvikamu zvefirimu zvinobatsira zvisina kukuvadzwa. Mazuva ano, wire width ye chip yasvika 7mm, uye ion beam etching inofanirwa kugadzirira pateni yakanaka kudaro. Ion beam etching inzira yakaoma yekucheka ine high etching accuracy kana tichienzanisa nenzira ye wet etching yakashandiswa pakutanga.

Tekinoroji yekucheka danda reIon ine danda reIon risingashande uye danda reIon rinoshanda rine mhando mbiri. Yekutanga ine danda reArgon ion, ndeyekuita kwemuviri; yekupedzisira ine danda reFluorine ion rinoputika, danda reFluorine ion pamwe nesimba rakawanda rekugadzira basa reTramp, danda reFluorine ion rinogonawo kugadzirwa neSiO2.₂、Si₃N4, GaAs, W nedzimwe firimu dzakatetepa dzine maitiro emakemikari, zvese zviri zviviri maitiro emuviri, asiwo maitiro emakemikari ekuita tekinoroji ye ion beam etching, mwero wekucheka unokurumidza. Kucheka kwekugadzirisa magasi anoparadza ndeye CF₄、C₂F₆、CCl4、BCl₃, nezvimwewo, reactants dzakagadzirwa dzeSiF₄、SiCl₄、GCl₃uye WF₆ magasi anoparadza anoburitswa. Tekinoroji yekucheka danda reIon ndiyo tekinoroji huru yekugadzira zvigadzirwa zvetekinoroji yepamusoro.

–Chinyorwa ichi chakaburitswa namugadziri wemuchina wevacuum coatingGuangdong Zhenhua