(3) Radio Frequency Plasma CVD (RFCVD)RF e ka sebelisoa ho hlahisa plasma ka mekhoa e 'meli e fapaneng, mokhoa oa ho kopanya capacitive le mokhoa oa ho kopanya oa inductive.RF plasma CVD e sebelisa maqhubu a 13.56 MHz.Molemo oa RF plasma ke hore e hasana holim'a moeli o moholo haholo ho feta microwave, plasma ke hore maqhubu a lero la mali ha a optimaling bakeng sa ho sputtering, haholo-holo haeba plasma e na le argon.Capacitively coupled plasma ha e loketse ho hōla lifilimi tsa taemane tsa boleng bo phahameng kaha ion bombardment e tsoang ho plasma e ka lebisa tšenyo e khōlō ea taemane. Lifilimi tsa daemane tsa Polycrystalline li se li holisitsoe ho sebelisoa plasma e hlahisitsoeng ke RF tlasa maemo a deposition a tšoanang le microwave plasma CVD. Homogeneous epitaxial diamond films le tsona li fumanoe ho sebelisoa RF-induced plasma-enhanced CVD.
(4) DC Plasma CVD
DC plasma ke mokhoa o mong oa ho kenya mohloli oa khase (ka kakaretso ke motsoako oa H2, le khase ea hydrocarbon) bakeng sa kholo ea filimi ea daemane. DC plasma-assisted CVD e na le bokhoni ba ho hōlisa libaka tse kholo tsa lifilimi tsa daemane, 'me boholo ba sebaka sa kgolo bo lekanyelitsoe feela ke boholo ba li-electrode le motlakase oa DC. li kenngoa ka sekhahla sa 80 mm / h. Ntle le moo, kaha mekhoa e fapaneng ea arc ea DC e ka beha lifilimi tsa daemane tsa boleng bo holimo ho li-substrates tseo e seng tsa daemane ka litefiso tse phahameng tsa deposition, li fana ka mokhoa o ka rekisoang oa ho beha lifilimi tsa daemane.
(5) Electron cyclotron resonance microwave plasma e matlafalitsoeng ke mouoane oa lik'hemik'hale (ECR-MPECVD) The DC plasma, RF plasma, le microwave plasma e hlalositsoeng pejana kaofela e arola le ho bola H2, kapa hydrocarbons, ho ba lihlopha tsa athomo ea hydrogen le carbon-hydrogen athomo, kahoo e kenya letsoho ho thehoeng ha filimi e tšesaane ea taemane. Ho tloha ka elektrone cyclotron resonance plasma ka hlahisa phahameng segokanyipalo plasma (> 1x1011cm-3), ECR-MPECVD ke loketseng ho feta bakeng sa kgolo le deposition filimi taemane. Leha ho le joalo, ka lebaka la khase e tlaase khatello ea (10-4- ho 10-2 Torr) sebelisoa ka tshebetso ECR, e leng se fellang ka e tlaase e loketseng bakeng sa deposition sekgahla sa filimi ea taemane hona joale ke deposition filimi. laboratori.
-Sengoloa sena se lokollotsoe ke moetsi oa mochini oa vacuum coating Guangdong Zhenhua
Nako ea poso: Jun-19-2024