(3) Radio Frequency Plasma CVD (RFCVD)RF inogona kushandiswa kugadzira plasma nenzira mbiri dzakasiyana, nzira yekubatanidza capacitive uye nzira yekubatanidza inductive.RF plasma CVD inoshandisa frequency ye13.56 MHz. Chakanakira RF plasma ndechekuti inopararira munzvimbo yakakura kupfuura microwave plasma. Zvisinei, muganho weRF capacitively coupled plasma ndeyekuti frequency yeplasma haina kunaka pakusputtering, kunyanya kana plasma ine argon. Capacitively coupled plasma haina kukodzera kukura madhaimani emhando yepamusoro sezvo ion bombardment kubva muplasma inogona kukonzera kukuvara kwakanyanya kudhaimani. Madhaimani ePolycrystalline akakurira achishandisa RF induced plasma pasi pemamiriro ezvinhu akafanana ne microwave plasma CVD. Madhaimani eepitaxial epitaxial akawanikwawo achishandisa RF-induced plasma-enhanced CVD.
(4) DC Plasma CVD
Plasma yeDC ndeimwe nzira yekuvandudza gasi (kazhinji musanganiswa weH2, negasi rehydrocarbon) kuti dhaimani rikure. CVD inobatsirwa neplasma yeDC ine kugona kukura munzvimbo dzakakura dzemadhaimani, uye saizi yenzvimbo yekukura inongogumira chete nehukuru hwemaelectrodes uye simba reDC. Imwe mukana weDC plasma-assisted CVD ndeyekuumbwa kwejekiseni reDC, uye mafirimu edhaimani anowanikwa nehurongwa uhwu anoiswa pachiyero che80 mm/h. Pamusoro pezvo, sezvo nzira dzakasiyana dzeDC arc dzichigona kuisa mafirimu edhaimani emhando yepamusoro pazvigadziko zvisiri zvedhaimani pachiyero chepamusoro chekuisa, dzinopa nzira inotengeswa yekuisa mafirimu edhaimani.
(5) Electron cyclotron resonance microwave plasma enhanced chemical vapor deposition (ECR-MPECVD) Iyo DC plasma, RF plasma, uye microwave plasma yakatsanangurwa kare zvese zvinoparadzanisa nekuora H2, kana mahydrocarbons, kuita mapoka eatomu hydrogen necarbon-hydrogen atomu, zvichibatsira mukuumbwa kwemafirimu matete edhaimani. Sezvo electron cyclotron resonance plasma ichigona kugadzira plasma ine density yakakura (>1x1011cm-3), ECR-MPECVD yakakodzera kukura nekuiswa kwemafirimu edhaimani. Zvisinei, nekuda kwekumanikidzwa kwegasi kwakaderera (10-4- kusvika 10-2 Torr) inoshandiswa muECR process, izvo zvinoguma nekuiswa kwakaderera kwemafirimu edhaimani, nzira iyi parizvino yakakodzera chete kuiswa kwemafirimu edhaimani murabhoritari.
–Chinyorwa ichi chakaburitswa nemugadziri wemuchina wevacuum coating Guangdong Zhenhua
Nguva yekutumira: Chikumi-19-2024

