Ion beam sputtering coating uye ion beam etching

1. Ion beam sputtering coating

Iyo pamusoro pezvinhu inoputirwa neiyo yepakati-simba ion danda, uye simba reiyoni haripindi mukristaro lattice yechinhu, asi kuendesa simba kumaatomu anotariswa, zvichiita kuti apupuke kubva pamusoro pechinhu, uye obva agadzira firimu rakatetepa nekuisa pane workpiece. Nekuda kwekuputika kunoitwa neion beam, simba remaatomu emufirimu akaputirwa akakwira zvakanyanya, uye chinhu chinonangwa chinoputirwa neion beam mune yakakwira vacuum, kuchena kweiyo firimu layer kwakakwira, uye mafirimu emhando yepamusoro anogona kuiswa, uku kugadzikana kweion beam film layer inovandudzwa, iyo inokwanisa kuzadzisa chinangwa chemugadziriso wemufirimu. Chinangwa cheiyo ion beam sputtering ndechekugadzira zvitsva zvitete zvemufirimu zvinhu.

2. Ion danda rekucheka

Ion beam etching zvakare iri yepakati-simba ion danda bhomba pamusoro pechinhu kuti ibudise sputtering, etching mhedzisiro pane substrate, iri semiconductor mudziyo, optoelectronic zvishandiso uye dzimwe nzvimbo dzekugadzirwa kweiyo graphics core tekinoroji. Iyo tekinoroji yekugadzirira machipisi mu semiconductor yakabatanidzwa maseketi inosanganisira kugadzirira kwemamiriyoni e transistors pane imwechete-crystal silicon wafer ine dhayamita ye Φ12in (Φ304.8mm). Imwe neimwe transistor inovakwa kubva kune akawanda akaturikidzana emafirimu akaonda ane mabasa akasiyana, anosanganisira ainoshanda layer, insulating layer, yekuzviparadzanisa layer, uye conductive layer. Imwe neimwe dhizaini ine patani yayo, saka mushure mekunge imwe neimwe firimu inoshanda yakapfava, zvikamu zvisingabatsiri zvinoda kuvharirwa kure neion danda, zvichisiya zvikamu zvemufirimu zvinobatsira. Mazuva ano, hupamhi hwewaya hwechip hwasvika 7mm, uye ion beam etching inofanirwa kugadzirira iyo yakanaka pateni. Ion beam etching inzira yakaoma etching ine high etching accuracy kana ichienzaniswa neye wet etching method yakashandiswa pakutanga.

Ion beam etching tekinoroji ine isingashande ion beam etching uye inoshanda ion danda etching nemhando mbiri. Iyo yekutanga ine argon ion beam etching, ndeyekuita kwemuviri; iyo yekupedzisira ine fluorine ion beam sputtering, fluorine ion danda mukuwedzera kune yakakwira simba kuburitsa basa re tramp, fluorine ion beam inogona zvakare kuiswa neSiO.₂, Si₃N4, GaAs, W uye mamwe mafirimu akaonda ane kemikari yekuita, iwo ese ari maviri maitiro ekuita kwemuviri, asiwo kemikari maitiro eiyo ion beam etching tekinoroji, chiyero cheetching chinokurumidza. Reaction etching corrosive gases is CF₄, C₂F₆, CCl4 BCl₃, nezvimwewo, izvo zvinogadzirwa zveSiF₄, SiCl₄, GCl₃uye Wf₆ gasi rinoparadza rinotorwa. Ion beam etching tekinoroji ndiyo yakakosha tekinoroji kugadzira zvigadzirwa zvemhando yepamusoro.

-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua